2021
DOI: 10.1002/aelm.202100665
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Optoelectronic Functionality of BiFeO3–SrTiO3 Interface

Abstract: One effective way to extend the functional degree of freedom for semiconductors is to introduce structural defects (e.g., surface or interface) and chemical defects as they commonly exist and modify the properties of the entity. Here, the optoelectronic properties of bismuth ferrite thin films and their tuning by the interface between the film and the strontium titanate substrate are reported. The defects that have been demonstrated, especially oxygen vacancies, are of paramount importance in the photoelectric… Show more

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Cited by 9 publications
(8 citation statements)
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“…However, for the stripe domain thin film, J b first increases to about 225-250 K, and then decrease, remarkably differs from the behavior of monodomain BFO thin films. This hints that the origin of the photocurrent background of stripe domain structure might be related to the interplay between the defecttrap levels with the quasi-Fermi level shifting due to the temperature varying as we have previously shown [18,19] In this regard, we measured the photocurrent growth-decay behavior aiming to explore recombination and trapping effects as this is the fingerprint of the defect-trap levels. The experimental setup is schematically shown in Figure 2a, the details of which can be referred to the ref.…”
Section: Resultsmentioning
confidence: 92%
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“…However, for the stripe domain thin film, J b first increases to about 225-250 K, and then decrease, remarkably differs from the behavior of monodomain BFO thin films. This hints that the origin of the photocurrent background of stripe domain structure might be related to the interplay between the defecttrap levels with the quasi-Fermi level shifting due to the temperature varying as we have previously shown [18,19] In this regard, we measured the photocurrent growth-decay behavior aiming to explore recombination and trapping effects as this is the fingerprint of the defect-trap levels. The experimental setup is schematically shown in Figure 2a, the details of which can be referred to the ref.…”
Section: Resultsmentioning
confidence: 92%
“…A time‐ and temperature‐dependent reducing H 2 or oxidizing O 2 atmosphere annealing treatment was specifically introduced to increase and decrease the density of oxygen vacancies, respectively. [ 18 ] The detail of each annealing process is given in Table 1 .…”
Section: Resultsmentioning
confidence: 99%
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“…Further details of the BFO/STO growth and treatment conditions can be found in the recently published report. [30] Top Electrode Fabrication: Classical photolithography process was used to structure rectangular DC sputtered ≈60 nm Au electrode pairs (900 × 600 µm) on the top of BFO thin films. The spacing of the electrode pairs was ranging from 10 to 200 µm.…”
Section: Methodsmentioning
confidence: 99%
“…[29] Under illumination, the photoinduced charge carriers initially reach an equilibrium state and fill the levels located under the Fermi level. [28,30] After switching off the light, apart from the direct recombination process, the trapped charge carriers are gradually re-emitted, leading to the prolonged decay time through a de-trapping process. This should be responsible for the persistent behavior of enhanced PFM amplitude signals.…”
Section: T a E Ae T Tmentioning
confidence: 99%