Journal of the Korean Crystal Growth and Crystal Technology
 2011
DOI: 10.6111/jkcgct.2011.21.2.060
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Optoelectronic properties of the Metal-dielectric complex thin films for applying high sensitivity IR image sensors

Yena Kim1,
Soon Woo Kwon2,
Seung Jun Park3
et al.

Abstract: High sensitivity IR image sensors require materials characteristics with temperature coefficient of resistance (TCR) and IR range absorption. In this study, the metal-dielectric thermo sensitive films (MDTF) based on (SiO 2

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