2009
DOI: 10.1117/12.853513
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Optoelectronic techniques for constructive characterization of SAW microdevices

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Cited by 2 publications
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“…From an operating frequency of about 1GHz in 1990, the value of operating frequency will climb to about 10GHz by 2010, and resolution for production lithography will climb to about 15 nm by 2010, [11]. A new promising acoustic wave device for high sensitivity bio-detection sensors is the film bulk acoustic resonator -FBAR sensor.…”
Section: Saw Devices Technology Overviewmentioning
confidence: 99%
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“…From an operating frequency of about 1GHz in 1990, the value of operating frequency will climb to about 10GHz by 2010, and resolution for production lithography will climb to about 15 nm by 2010, [11]. A new promising acoustic wave device for high sensitivity bio-detection sensors is the film bulk acoustic resonator -FBAR sensor.…”
Section: Saw Devices Technology Overviewmentioning
confidence: 99%
“…Low frequency devices (up to 200 MHz) were fabricated using traditional optical lithography and the high frequency devices (900 MHz) were fabricated by using electron beam lithography. The line width and spacing of λ/4 of about 100 nm cover the frequencies above 10GHz [11]. The big success of today's SAW micro-devices industry is based on various factors, among others, the development of novel piezoelectric materials and the rapid evolution of resolution for production photolithography, in the last years.…”
Section: Saw Devices Technology Overviewmentioning
confidence: 99%
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