2000
DOI: 10.1002/(sici)1521-396x(200002)177:2<419::aid-pssa419>3.0.co;2-j
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Ordering and Magnetic Susceptibility of Non-Stoichiometric Hafnium Carbide

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Cited by 23 publications
(11 citation statements)
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“…The cell parameters of HfC in B16, B16II, and B18 were 0.4635(0), 0.4638(2), and 0.4638(3) nm, respectively. All these values were lower than those reported for HfC by Cotter et al (0.4641 nm), 14 Gusev et al (0.46408 nm), 1 and JCPDS card No. 65‐2906 (0.4640 nm) 21…”
Section: Resultscontrasting
confidence: 60%
See 1 more Smart Citation
“…The cell parameters of HfC in B16, B16II, and B18 were 0.4635(0), 0.4638(2), and 0.4638(3) nm, respectively. All these values were lower than those reported for HfC by Cotter et al (0.4641 nm), 14 Gusev et al (0.46408 nm), 1 and JCPDS card No. 65‐2906 (0.4640 nm) 21…”
Section: Resultscontrasting
confidence: 60%
“…H afnium carbide (HfC) has a face‐centered cubic NaCl crystal structure and possesses a wide homogeneity region from HfC 0.59 to HfC 1.0 1 . It has very high melting point (3950°±40°C), low vapor pressure, low electrical resistivity (∼37–45 μΩ·cm), and high chemical stability.…”
Section: Introductionmentioning
confidence: 99%
“…The only phase in the powder heated to 2000°C was ZrC x with all of the peaks indexed to ICDD PDF card 35-0784. While XRD was able to identify the formation of ZrC x, it was not able to provide information about carbon-site occupancy or carbon stoichiometry due to the low x-ray scattering cross section of carbon (6), nitrogen (7), and oxygen (8) compared to zirconium (40).…”
Section: Resultsmentioning
confidence: 99%
“…Experimental phase diagrams for the Zr–C show that ZrC x is stable for x values ranging from 0.63 to 0.98 . Similarly, variable carbon stoichiometry is exhibited by other TMCs, such as TiC x , HfC x , VC x , NbC x , TaC x , and WC x . Carbon stoichiometry affects the sinterability, mechanical properties, electrical properties, and radiation resistance of ZrC x ceramics.…”
Section: Introductionmentioning
confidence: 98%
“…Therefore, HfC has been researched extensively as promising anti-oxidative coatings at high temperature, and on the other side it also has been investigated as hard protective films. Moreover, many techniques have been used for preparation of HfC films such as chemical vapor deposition [19,21,22], reactive melt infiltration [18], solid-phase sintering [23], electron beam deposition [17], pulsed laser ablation [16,24], magnetron sputtering, etc. [25].…”
Section: Page 5 Of 37mentioning
confidence: 99%