Ordering of 6-nm-sized nanodot arrays with 10-nm-pitch using self-assembled block copolymers along electron beam-drawn guide-lines

Abstract

We studied the possibility to form long-rangeordering of self-assembled nanodot arrays with a dot size of 6 nm and a dot pitch of 12 nm using guideline templates for ultrahigh-density patterned media. This was realized by using self-assembled block copolymers of polystyrenepoly dimethyl siloxane (PS-PDMS) and the templates made of hydrogen silsesquioxane (HSQ) negative electron beam (EB) resist. We have demonstrated that the method could possibly achieve a minimum pitch of about 10 nm using PS-PDMS of molecular weight 7000-1500 g/mol and EB-drawn guide lines. These results evidence the promising potential of a technology for achieving 5 Tbit/in 2 magnetic storage devices.

Formation of 7-nm-wide Line&Spaces in Half Pitch by 3 Dimensional Self-assembly of Nano-dots Using Sphere Type PS-PDMS

“…1(a) shows to order PS-PDMS spheres (dots) as line on the flat substrate by controlling thickness of the PS-PDMS film as monolayer. The dot diameter of about 16 nm is estimated from our experiments [5], [6], [15]. Using thicker film as same as double layers of PS-PDMS sphere, stacking structure of the PS-PDMS spheres is formed on the 1 st dots pattern.…”