2015
DOI: 10.1016/j.ultramic.2015.05.005
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Orientation contrast of secondary electron images from electropolished metals

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Cited by 2 publications
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“…Subsequently, after grinding and polishing with colloidal silica solution of 0.04 μm, the precipitate distribution and microstructural morphology were characterized and analyzed by field‐emission SEM of Carl Zeiss Supra 55 with 5 kV at a working distance of 5 mm with BEI. In addition, based on the SEM parameter setting (Chen et al ., ), we obtained the BEI at the voltage of 5 kV, which shows the strain field pattern around the grain boundary and precipitates. The average particle size of Laves phase was calculated by the ImageJ software using the limned and measured function.…”
Section: Experimental Processmentioning
confidence: 97%
“…Subsequently, after grinding and polishing with colloidal silica solution of 0.04 μm, the precipitate distribution and microstructural morphology were characterized and analyzed by field‐emission SEM of Carl Zeiss Supra 55 with 5 kV at a working distance of 5 mm with BEI. In addition, based on the SEM parameter setting (Chen et al ., ), we obtained the BEI at the voltage of 5 kV, which shows the strain field pattern around the grain boundary and precipitates. The average particle size of Laves phase was calculated by the ImageJ software using the limned and measured function.…”
Section: Experimental Processmentioning
confidence: 97%