Optimization of thin film deposition is often the limiting
step
in the discovery of new materials and device development. Over the
years, high-throughput combinatorial methods were developed for the
deposition of thin films from the gas phase. However, very few reports
focused on combinatorial thin film deposition from solution. Here,
we introduce a combinatorial approach for the deposition of thin films
from solution. The flow deposition setup allows for simultaneously
studying the effect of two critical parameters, deposition time and
deposition temperature, on a single sample. As a proof of concept,
we demonstrate the solution deposition of PbS thin films, which resulted
in a library of 25 deposition condition combinations on a single GaAs
(100) substrate. X-ray diffraction and scanning electron microscopy
combined with focused ion beam cross-sectional sample preparation
confirmed the formation of high-quality PbS films and showed the morphology
evolution as a function of these two deposition parameters. This method
can be easily adapted for cost-effective and rapid combinatorial studies
of a large variety of solution-deposited thin film materials.