Overview of FERMI@ELETTRA: a proposed ultra-bright coherent X-ray source in Italy

Presently there is strong interest in developing a 4th generation light source at VUV and soft x-ray wavelengths at the ELETTRA facility at Trieste. One proposal centers around using the existing linac at 1.0 GeV energy with a new photocathode and bunch compression to achieve an output beam at 600 Amp current, 2-4 mm-mrad normalized emittance, and 0.05% instantaneous energy spread. To achieve output radiation in the 10-to 40-nm wavelength region, we consider a multi-stage device which is initiated by a coherent seed laser operating at 200 nm. We present numerical simulations of various undulator/optical-klystron configurations, seeking to optimize the overall output power level while minimizing the total length of undulator sections needed. Our results suggest multi-MW instantaneous powers are possible at 10-nm wavelengths.

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“…Another paper in these proceedings [4] gives additional details concerning the ELET-TRA XUV FEL proposal.…”

Section: Introductionmentioning

confidence: 99%

Simulation studies of a possible multi-stage XFEL at ELETTRA

Fawley

Barletta

Bocchetta

et al. 2003

Nuclear Instruments and Methods in Physics Research Section A:

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Lasers, Extreme UV, and Soft X‐ray

Nilsen

2015

The Optics Encyclopedia

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Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X‐ray lasers. Today, X‐ray lasers are tabletop, spatially coherent, high‐repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X‐ray regime between wavelengths of 10 and 50 nm. Over the past decade, X‐ray laser performance has been improved by the use of the grazing incidence geometry, diode‐pumped solid‐state lasers, and seeding techniques. The dominant X‐ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA) laser systems or capillary discharge. The CPA systems drive lasing in neon‐like or nickel‐like ions, typically in the 10–30 nm range, while the capillary system works best for neon‐like argon at 46.9 nm. Most researchers use nickel‐like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. The past decade has seen the birth of the X‐ray free electron laser (XFEL) that can reach wavelengths down to 0.1 nm and the inner‐shell Ne laser at 1.46 nm.

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