Oxidation of Amorphous Carbon Films by Ultraviolet Light Irradiation and Thermal Annealing

Abstract

Using polymer-like amorphous carbon films deposited using supermagnetron plasma, ultraviolet light irradiation and thermal annealing effects in air were studied. Upper and lower electrode rf powers (UPRF/LORF) were selected to be 5/5 W, and such films were deposited using i-C 4 H 10 , and N 2 or H 2 plasma chemical vapor deposition (CVD). For comparison, polymer-like amorphous carbon films were deposited using Ar magnetron sputtering. By X-ray fluorescence spectroscopy (XFS), an increase in oxygen atom concentration and a small change in nitrogen atom concentration were observed under both ultraviolet (UV) light exposure and thermal annealing.

Broadband Dielectric Spectroscopy Analysis of Dielectric Properties of Barium Titanate Ceramics

“…The dielectric constant for coarse grain size (1000nm and 500nm) is much higher than fine grain size (100nm, 50nm, and 20nm) BTO ceramics. According to the previous work, the grain size corresponding to the maximum value of dielectric constant approximately 8,000 was measured to 1000nm [11], 700nm [12], 400nm [13], respectively. The maximum dielectric constant is 7,500 for 500nm grain size BTO ceramics.…”