Titanium diboride coatings (20 or 30 pm thick), deposited by hydrogen reduction of TiC14 and BC13, are protecting CISiC substrates against oxidation up to 1100 OC. The oxidation of TiB2 leads to the formation of a protective low viscosity B2O3 glass filling the cracks of the primary CVD-Sic oxygen barrier. Above this temperature, the rapid consumption of the Bz03 glass by vaporization limits the duration of the protection system. A comprehensive description of the oxidation mechanism, based on a complementary experimental study of B203 evaporation, is presented.