2005
DOI: 10.1016/j.apsusc.2005.01.019
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Oxidation protection of copper surfaces using self-assembled monolayers of octadecanethiol

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Cited by 112 publications
(77 citation statements)
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References 46 publications
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“…Hutt and Liu [23] showed that a thiol layer on copper will withstand oxidation at low temperatures but at ambient temperatures an oxide layer formed over a few weeks, mostly comprised of Cu2O. In the measurements performed here the thiol solution remains active and so reduction of the newly formed oxide can continue, generating the copper (I) thiolate film.…”
Section: Infrared Measurementsmentioning
confidence: 79%
“…Hutt and Liu [23] showed that a thiol layer on copper will withstand oxidation at low temperatures but at ambient temperatures an oxide layer formed over a few weeks, mostly comprised of Cu2O. In the measurements performed here the thiol solution remains active and so reduction of the newly formed oxide can continue, generating the copper (I) thiolate film.…”
Section: Infrared Measurementsmentioning
confidence: 79%
“…10c shows a single contribution that can be attributed to either Cu(I) [32,33], but excludes the presence of copper atoms in the oxidation state +2. The distinction between Cu(I) and Cu(0) can be achieved in the auger region of the spectrum and clearly there is presence of the peak at 930 eV, attributable to Cu(I) species [34], and a lower shoulder lying at 958 eV, ascribable to Cu. In fact, it is possible that the presence of Cu species appears as a broad signal at ∼531.6 eV for hydrated copper oxide and at 530 eV for crystalline Cu 2 O species due to possible humidity of the sample [35,36].…”
Section: Resultsmentioning
confidence: 96%
“…Since then, many different substances on different metals and alloys have been proven to be effective against corrosion. The list includes thiols [6][7][8][9][10][11][12][13][14][15][16][17][18][19], amines [12], phosphates [20], sulfates [21], thiosulfates [22], carboxylic acids [23][24][25][26][27][28][29], hydroxamic acids [29][30][31], amino acids [32][33][34], phosphonic acids [29,35], sulfonic acids [29], silane derivatives [36], as well as heterocyclic and other compounds [16,[37][38][39][40][41][42][43][44].…”
Section: Introductionmentioning
confidence: 99%