Oxidation resistance improvement of arc-evaporated TiN hard coatings by silicon addition

Steyer, Philippe; Pilloud, D.; Pierson, J.F.; Millet, Jean-Pièrre; Charnay, M.; Stauder, Bernhard; Jacquot, P.

doi:10.1016/j.surfcoat.2006.08.023

Cited by 57 publications

(17 citation statements)

References 34 publications

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“…Therefore, the hardness improvement should be attributed to both the solid solution strengthening (for Zr -prevailing coatings) and HallPetch effect. Considering a previous study of nanostructured coatings [27], lower hardness of films with finer grains (deficient of nitrogen) comparing to that with coarser ones (nearly -stoichiometric) can be attributed to deviations from grain boundary hardening described by the Hall-Petch relationship which is based on the dislocation pile-up mechanism: so-called inverse Hall-Petch effect [28]. Considering oxidation effects, a low hardness of coatings with deficiency of nitrogen may be related to the minor traces of surface oxides formation, which means reducing of nitrogen content diminishes the chemical stability of coatings.…”

Section: Mechanical Propertiesmentioning

confidence: 99%

Structure and Tribomechanical Properties of TiZrSiN Nanostructured Thin Films Deposited by Reactive Magnetron Sputtering

Пилько¹,

Komarov²

2018

AM&T

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For the first time, the structure and tribomechanical properties of TiZrSiN nanostructured thin films deposited by reactive magnetron sputtering have been investigated as a function of nitrogen content. Sputtering was performed using two targets of different composition: Ti 0.56 Zr 0.36 Si 0.08 and Ti 0.36 Zr 0.56 Si 0.08 at. %. Three various types of TiZrSiN nanocomposite, formed with nitrogen deficient, nearly stoichiometric, and over stoichiometric nitrogen concentrations have been studied. Structural properties and composition of coatings were analyzed using SEM, EDX, XRD and RBS techniques. Tribomechanical properties were investigated by means of indentation, using Oliver and Pharr method, and scratch tests. The results showed that the tribomechanical properties are closely correlated with both the compositional and the structural modifications of TiZrSiN coatings induced by the addition of nitrogen in different concentrations. Thus, depending on coating composition and nitrogen content the deposited films exhibit hardness values ranged from 16 to 32 GPa. The results are intensively discussed and suggestions, explaining the influence of nitrogen concentration on structural and tribomechanical properties are made.

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Section: Mechanical Propertiesmentioning

confidence: 99%

Structure and Tribomechanical Properties of TiZrSiN Nanostructured Thin Films Deposited by Reactive Magnetron Sputtering

Пилько¹,

Komarov²

2018

AM&T

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“…The group IVB (Ti, Zr and Hf) metal nitride coatings possess extraordinary characteristics of hardness [1][2][3][4], corrosion resistance [5][6][7] and decoration [8], but demonstrate inadequate oxidation resistance [9,10]. Ti-Si-N [11,12] and Zr-Si-N [13,14] have displayed enhanced oxidation resistance by Si addition. Although Hf-Si-N coatings have been applied as gate electrodes [15,16], corrosion-resistant films [17] and biocompatible films [18], few studies have focused on improving their oxidation resistance.…”

Section: Introductionmentioning

confidence: 99%

Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

2018

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Monolithic Hf-Si-N coatings and multilayered Hf-Si-N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf-Si-N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf 48 Si 3 N 49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young's modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15-16 GPa; this hardness is close to that of Si 3 N 4 . Various oxides were formed after annealing of the Hf-Si-N coatings at 600 • C in a 1% O 2 -99% Ar atmosphere. Monoclinic HfO 2 formed after Hf 54 N 46 annealing and amorphous oxide formed for the oxidation-resistant Hf 32 Si 19 N 49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy.

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“…It is well known that ternary and quaternary crystalline TiNbased coatings possess oxidation resistance well below 1000 • C, for instance: 740 • C (TiSiN) [6], 900 • C (TiAlN) [7,8], 800-950 • C (AlTiN) [9,10], 850 • C (TiAlSiN) [11], and 800 • C (TiAlCN) [12]. This limits the high-temperature applications of such coatings on high-speed cutting tools, turbine blades, special parts of super high-speed aircrafts, rockets, reusable launch vehicles, etc.…”

Section: Introductionmentioning

confidence: 99%