Oxide-semiconductor channel ferroelectric field-effect transistors for high-density memory applications: 3D NAND operation and the potential impact of in-plane polarization

Abstract

We have explored 3D NAND memory operation of oxide-semiconductor (OS) channel FeFETs by TCAD simulation with a multi-transistor NAND-string model. Key challenges in 3D NAND memory devices, such as (1) disturb from pass voltages (Vpass), (2) interference from neighboring wordlines (WLs), and (3) both conventional and self-boost program inhibit operation of unselected bitlines (BLs), are addressed. For a target device structure, operation voltages can be optimized to satisfy the requirement of (1)-(3). The stacking possibility of 3D NAND OS FeFETs is also predicted by conducting an extrapolation from TCAD simulation results. We have also studied the potential impact of in-plane polarization in the NAND FeFET string. A comparative study shows that in-plane polarization under the spacer may lead to unexpected characteristics of OS-channel FeFETs in 3D NAND memory operation. This paper will provide insights on the feasibility of 3D NAND FeFETs for high-capacity storage memory.