Oxide Surface Plasmon Resonance for a New Sensing Platform in the Near‐Infrared Range

Matsui, Hiroaki; Badalawa, Wasanthamala; Ikehata, Akifumi; Tabata, Hitoshi

doi:10.1002/adom.201200075

Cited by 35 publications

(22 citation statements)

References 32 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[ 4,27 ] In our experiments, these geometrical parameters, such as length (L), width (W), and distance between the antennas cannot be chosen completely independently and are linked via simple geometrical relations: [ 4,27 ] In our experiments, these geometrical parameters, such as length (L), width (W), and distance between the antennas cannot be chosen completely independently and are linked via simple geometrical relations:…”

Section: Full Paper Full Paper Full Papermentioning

confidence: 98%

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Bagheri

Gießen

Neubrech

2014

Advanced Optical Materials

View full text Add to dashboard Cite

and low-cost fabrication is required. Ideally, one would like to have low-cost and cm 2 sized chips, which provide plasmonic resonance over the whole area and can be simply put into standard infrared spectrometers, serving as smart substrates for the detection and identifi cation of biological or chemical substances. Randomly distributed metal island fi lms [ 10,11 ] or metal stripe gratings [ 12 ] enable such large-area fabrication, but their plasmonic enhancement is orders of magnitudes smaller than the one of tailored nanoantennas. In contrast, metal antennas prepared by bottomup approaches, such as nanosphere lithography, [13][14][15] offer higher enhancements but suffer from inhomogeneity on large scales. Recently, colloidal hole mask lithography [ 16,17 ] has been introduced as an approach to fabricate tailored nanostructures that provide high near-fi eld enhancements. However, due to intrinsic limitations of the method, only randomly distributed antennas can be realized. Other methods, like nanoimprint techniques, have their own limitation such as a slow fabrication process of mask. [18][19][20] In contrast laser interference lithography enables a fast preparation of tailored polymer and metal structures arranged in welldefi ned geometries on large scales up to 4 inches, [ 21 ] with a high structure density. [ 22 ] These characteristics make laser interference lithography a powerful tool for the fabrication of plasmonic materials with a broad range of applications, for example, plasmonic color fi ltering [ 23 ] or biosensing. [ 24,25 ] Also, the fabrication of substrates for antenna-assisted SEIRA is enabled by this fl exible approach as we will demonstrate in this paper.In particular, we will highlight the potential of laser interference lithography as a powerful tool for the fast and low-cost preparation of homogeneous large-area substrates for antennaassisted SEIRA. More specifi cally, we utilized laser interference lithography to prepare tailored metal structures featuring highquality plasmon resonances in the near-and mid-infrared spectral range. These substrates provide excellent SEIRA activity as we demonstrate with two different molecular layers attached to the antennas. Furthermore, they enable sensitive in situ monitoring of the UV degradation of polymers via the signal contrast in their vibrational spectra. Laser Interference LithographyThe interference of two coherent laser beams with wavelength λ causes a standing wave grating pattern which can be used Laser interference lithography is utilized to fabricate large-area plasmonic antenna substrates for surface-enhanced infrared absorption (SEIRA). Changing the interference condition in each exposure process allows precise control over the geometrical parameters of the structures and thus tailoring of their optical response. Independent of the underlying wafer, the technique enables a homogeneous preparation of antennas over cm 2 areas with tunable and high-quality plasmonic resonances in the near-and mid-infrared spectral range. The broad applic...

show abstract

Section: Full Paper Full Paper Full Papermentioning

confidence: 98%

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Bagheri

Gießen

Neubrech

2014

Advanced Optical Materials

View full text Add to dashboard Cite

show abstract

“…[3][4][5] Plasmonic-enhanced optical spectroscopes have been demonstrated with a view to developing new sensing platforms. 6,7 Theoretical approaches have also been utilized in the development plasmonic applications. 8,9 Doped oxide semiconductor NCs are useful plasmonic materials since their LSPR energies can be widely controlled by altering electron densities (n e ) in NCs.…”

mentioning

confidence: 99%

Role of electron carriers on local surface plasmon resonances in doped oxide semiconductor nanocrystals

Matsui

Furuta²,

Tabata

2014

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

Metal nanoantenna plasmon resonance lineshape modification by semiconductor surface native oxide J. Appl. Phys. 112, 044315 (2012); 10.1063/1.4748298 Coupling of single InGaAs quantum dots to the plasmon resonance of a metal nanocrystal Appl. Phys. Lett. 97, 043105 (2010); 10.1063/1.3467853Effective creation of oxygen vacancies as an electron carrier source in tin-doped indium oxide films by plasma sputtering

show abstract

“…Plasmonic nanomaterials based on transparent oxide semiconductors (TOSs, such as In 2 O 3 , ZnO and SnO 2 ) have received much attention as new optical phenomena with potential applications. In particular, oxide semiconductors with metallic conductivity by doping with intrinsic and/or extrinsic impurities show surface plasmon resonances (SPRs) in the infrared (IR) range [1][2][3][4][5]. Unlike noble metals (silver and gold), SPRs can be controlled by tuning the physical characters of a material [6][7][8], which provides new possibilities for optical manipulation of light.…”

Section: Introductionmentioning

confidence: 99%

Infrared Solar Thermal-Shielding Applications Based on Oxide Semiconductor Plasmonics

Matsui¹,

Tabata²

2017

Nanoplasmonics - Fundamentals and Applications

Self Cite

View full text Add to dashboard Cite

This chapter describes plasmonic responses in In 2 O 3 :Sn nanoparticles (ITO NPs) and their assembled ITO NP sheets in the infrared (IR) range. ITO NPs clearly provide resonance peaks related to local surface plasmon resonances (LSPRs) in the near-IR range, which are dependent on electron density in the NPs. In particular, electron-impurity scattering plays an important role in determining carrier-dependent plasmon damping, which is needed for the design of plasmonic materials based on ITO. ITO NPs are mainly dominated by light absorption. However, a high light reflection is observed in the nearand mid-IR range when using assembled NP sheets. This phenomenon is due to the fact that the introduction of surface modifications to the NPs can facilitate the production of electric-field (E-field) coupling between the NPs. The three-dimensional (3D) E-field coupling allows for resonant splitting of plasmon excitations to the quadrupole and dipole modes, thereby obtaining selective high reflections in the IR range. The high reflective performances from the assembled NP sheets were attributed to the plasmon interactions at the internanoparticle gaps. This work provides important insights for harnessing IR optical responses based on plasmonic technology toward the fabrications of IR solar thermal-shielding applications.

show abstract

Oxide Surface Plasmon Resonance for a New Sensing Platform in the Near‐Infrared Range

Cited by 35 publications

References 32 publications

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

Role of electron carriers on local surface plasmon resonances in doped oxide semiconductor nanocrystals

Infrared Solar Thermal-Shielding Applications Based on Oxide Semiconductor Plasmonics

Contact Info

Product

Resources

About