Ion implantation of ruthenium into titanium was used to produce near‐surface alloys of controllable surface composition. The thin oxide layer that was formed in situ at the surface of the implanted alloy was taken as a model for
RuxTi1−xO2
(DSA) electrodes. The time dependence of the surface ruthenium/titanium ratio in the mixed oxide was correlated to the original implant profile, measured by Rutherford backscattering, with the assumption of no preferential dissolution. Modification of the band structure of the mixed oxide with Ru concentration was studied by in situ photoacoustic and photocurrent spectroscopies coupled with potentiodynamic polarization measurements. The experimental results are interpreted in terms of a transition from a semiconducting layer to a metallic‐like layer when the ruthenium/titanium ratio reaches a value of about 0.10.