1999
DOI: 10.1103/physrevb.60.14396
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Oxygen adsorbed on oxidized Ru(0001)

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Cited by 112 publications
(123 citation statements)
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“…The O br /− termination is routinely observed experimentally after high temperature anneals in UHV, whereas the O br /O cus termination can be stabilized by oxygen post-exposure [10,[22][23][24]. Extensive theoretical work over the last years has shown that O and CO adsorption at other sites of the surface is energetically significantly less favorable than adsorption at bridge and cus sites [10,[23][24][25][26], which is consistent with all presently available experimental data [6,10,[27][28][29][30][31][32].…”
Section: Co Oxidation At Ruo (110)supporting
confidence: 83%
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“…The O br /− termination is routinely observed experimentally after high temperature anneals in UHV, whereas the O br /O cus termination can be stabilized by oxygen post-exposure [10,[22][23][24]. Extensive theoretical work over the last years has shown that O and CO adsorption at other sites of the surface is energetically significantly less favorable than adsorption at bridge and cus sites [10,[23][24][25][26], which is consistent with all presently available experimental data [6,10,[27][28][29][30][31][32].…”
Section: Co Oxidation At Ruo (110)supporting
confidence: 83%
“…Practically identical activities were subsequently obtained by Peden and Goodman [4], also for the Ru(0001) single crystal surface, on which I will focus from now on. This clear manifestation of a pressure gap could be resolved by extensive experimental and theoretical work, which showed that in oxygen-rich reactive environments RuO 2 forms at the surface [5][6][7][8][9][10][11][12]. While under UHV conditions the CO oxidation therefore takes place at the inactive Ru surface, the measured high catalytic activity in ambient conditions is instead actuated by the formed oxide film [8,[12][13][14][15].…”
Section: Oxide Formation In the Reactive Environmentmentioning
confidence: 99%
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“…3 we present the calculated work-functions together with experimental values. References for experiments: Co [23], Ni [23], Cu [23], Ru [24,25], Rh [26], Pd [27], Ag [23], Ir [23], Pt [26,28], Au [23].…”
Section: B Work-functionmentioning
confidence: 99%
“…Recently, a mechanism was presented for the formation of an oxygen ad-layer through subsurface oxides using TDS and UPS. [7] An understanding of these initial oxide stages can be instrumental in developing methods for mitigation of oxidation in EUV lithography. XPS is a powerful technique for identifying chemical states.…”
Section: Introductionmentioning
confidence: 99%