Residual strains in cubic silicon carbide measured by Raman spectroscopy correlated with x-ray diffraction and transmission electron microscopy Annealed Czochralski Silicon wafers containing SiO x precipitates have been studied by high energy X-ray diffraction in a defocused Laue setup using a laboratory tungsten tube. The energy dispersive evaluation of the diffracted Bragg intensity of the 220 reflection within the framework of the statistical dynamical theory yields the static Debye-Waller factor E of the crystal, which gives access to the strain induced by the SiO x precipitates. The results are correlated with precipitate densities and sizes determined from transmission electron microscopy measurements of equivalent wafers. This allows for the determination of the constrained linear misfit e between precipitate and crystal lattice. For samples with octahedral precipitates the values ranging from e ¼ 0.39 (þ0.28/À0.12) to e ¼ 0.48 (þ0.34/À0.16) indicate that self-interstitials emitted into the matrix during precipitate growth contribute to the lattice strain. In this case, the expected value calculated from literature values is e ¼ 0.26 6 0.05. Further, the precise evaluation of Pendell€ osung oscillations in the diffracted Bragg intensity of as-grown wafers reveals a thermal Debye-Waller parameter for the 220 reflection B 220 (293 K) of 0.5582 6 0.0039 Å 2 for a structure factor based on spherically symmetric scattering contributions. V C 2014 AIP Publishing LLC. [http://dx.