Oxygen induced segregation of aluminum to α-Cu–Al(100) alloy surfaces studied by low energy ion scattering and X-ray photoelectron spectroscopy

Kravchuk, T.; Hoffman, A.

doi:10.1016/j.susc.2006.09.008

Cited by 14 publications

(8 citation statements)

References 21 publications

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“…This must be linked to the presence of points defects highlighted recently by ab initio calculations [60]: in Cu-rich alloys, the dominant defects are Cu antisites on the Al sublattice with Wyckoff position 4e (inner tetrahedron), while in Al-rich compounds, they are Al antisites on the Cu sublattice with Wyckoff position 4e (inner tetrahedron). This is also in line with previous results reported in α -Cu-Al solid solutions containing 9–16 at.% Al [61–64] and with DFT calculations on the segregation of Cu atoms embedded in an Al matrix, showing that the presence of copper in the topmost layer is energetically unfavourable [65]. The detailed understanding of the refined surface structure is challenging, and cannot be explained simply by a pure aluminum surface termination, since bias dependence is observed in STM images.…”

Section: Cma Surfaces Of Lower Structural Complexitysupporting

confidence: 94%

Surfaces of Al-based complex metallic alloys: atomic structure, thin film growth and reactivity

Ledieu

Gaudry

Fournée

2014

Science and Technology of Advanced Materials

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We present a review on recent work performed on periodic complex metallic alloy (CMA) surfaces. The electronic and crystallographic structures of clean pseudo-tenfold, pseudo-twofold, sixfold surfaces will be presented along with the recent findings on CMA of lower structural complexity, i.e. with a smaller unit cell. The use of CMA surfaces as templates for thin film growth and the formation of surface alloy will also be introduced. The reactivity of these complex surfaces and their impact in the field of heterogeneous catalysis will be discussed. Finally, common trends among these systems will be highlighted when possible and future challenges will be examined.

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Section: Cma Surfaces Of Lower Structural Complexitysupporting

confidence: 94%

Surfaces of Al-based complex metallic alloys: atomic structure, thin film growth and reactivity

Ledieu

Gaudry

Fournée

2014

Science and Technology of Advanced Materials

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“…% Al. [63][64][65][66] This is in line with recent work 67 performed by DFT on the segregation of Cu atoms embedded in an Al matrix showing that the presence of copper in the topmost layer is energetically unfavorable.…”

Section: Departure From the Ideal Picturesupporting

confidence: 88%

Structural investigation of the (110) surface ofγ-Al4Cu9

et al. 2010

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We present a detailed study of the ͑110͒ surface of the ␥-Al 4 Cu 9 crystal using both experimental methods and first-principles calculations based on density-functional theory. Our experimental approach, using lowenergy electron diffraction, scanning tunneling microscopy ͑STM͒ images, and x-ray photoelectron spectroscopy highlights the presence of two types of surface terminations. Combining experimental results and simulations provides many arguments to match the two observed surfaces with the two puckered terminations built from bulk truncation: ͑i͒ calculations show that these two puckered terminations present lower surface energies compared to another conceivable flat termination obtained also from bulk truncation, ͑ii͒ step height measurements are consistent with calculated interlayer spacings and ͑iii͒ simulated STM images are in reasonable agreement with the experimental ones and mirror the experimental voltage dependence.

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“…The oxidation of copper has been studied extensively on single crystals [42][43][44] and alloy systems [45] . Surface oxide films have been found to form in parallel with extensive dissolution and sub-surface oxidation processes.…”

Section: Redox Chemistry Of Cu: Oxidation Of Cu 2 O To Cuomentioning

confidence: 99%

Ambient pressure photoelectron spectroscopy: A new tool for surface science and nanotechnology

Salmerón

Schlögl

2008

Surface Science Reports

711

626

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Oxygen induced segregation of aluminum to α-Cu–Al(100) alloy surfaces studied by low energy ion scattering and X-ray photoelectron spectroscopy

Cited by 14 publications

References 21 publications

Surfaces of Al-based complex metallic alloys: atomic structure, thin film growth and reactivity

Surfaces of Al-based complex metallic alloys: atomic structure, thin film growth and reactivity

Structural investigation of the (110) surface ofγ-Al4Cu9

Ambient pressure photoelectron spectroscopy: A new tool for surface science and nanotechnology

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