2006
DOI: 10.1103/physrevb.74.024106
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Oxygen-vacancy-related dielectric anomaly inCaCu3Ti4O12: Post-sintering annealing studies

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Cited by 88 publications
(38 citation statements)
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“…The existence of a peak in the real part of the dielectric constant was reminded of the ferroelectric phase transition [17][18][19][20]. The cooperation of the localized positive and negative carriers as well as the Maxwell-Wagner-type relaxation can also generate a dielectric peak [21][22][23]. However, the frequency independence of the peak position as well as the absence of the dielectric peak in the cooling process in our experiments excludes these possibilities.…”
Section: Resultscontrasting
confidence: 41%
“…The existence of a peak in the real part of the dielectric constant was reminded of the ferroelectric phase transition [17][18][19][20]. The cooperation of the localized positive and negative carriers as well as the Maxwell-Wagner-type relaxation can also generate a dielectric peak [21][22][23]. However, the frequency independence of the peak position as well as the absence of the dielectric peak in the cooling process in our experiments excludes these possibilities.…”
Section: Resultscontrasting
confidence: 41%
“…For reaction 3, it is proposed based on the limited diffusion of oxygen at grain boundary during the cooling stage, which prevents reoxidation of partial Cu + into Cu 2+ ions. The compensation is possibly due to the partial reduction of Ti 4+ to Ti 3+ ions on the B site sub-lattice [9,17]. Cu + on Cu 2+ site and Ti 3+ on Ti 4+ site carries effective negatively charges of and , respectively, which turns the grains into a semiconductor.…”
mentioning
confidence: 99%
“…So the dielectric anomaly behavior in the Ta-LTO crystal sample might be related to the oxygen vacancies. An oxygen-related dielectric anomaly has been reported in different material systems [32][33][34]. Two oxygen-vacancy-related relaxation processes have been reported [35]: a dipolar relaxation related to the hopping motions of oxygen vacancy and a Maxwell-Wagner relaxation as the defects were blocked by the interface on sample contacts.…”
Section: Resultsmentioning
confidence: 99%