2008
DOI: 10.1889/1.3069572
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P‐197: Improved Patterned VA Mode for Fast Response Time by Using Strong Fringe‐Field Effect

Abstract: We propose an improved pattern structure that can reduce the response time by using strong fringe field in the pattern vertical alignment LCD. We applied an additional buried electrode in the PVA LCD so that we could increase the fringe field on the edge of the electrode. The strong fringe field on the edge of the electrode helps the liquid crystal director in the bulk area to have an appropriate orientation quickly when the voltage is applied. As a result, we could improve the response time effectively. We us… Show more

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