P‐63: Lower Reflective TFT Materials and Technology Innovation

Wang, Shoukun; Guo, Huibin; Song, Yuanyuan; Ma, Guojing; Li, Shengxuan; Zhang, Liang; Shao, Xin

doi:10.1002/sdtp.11928

Cited by 7 publications

(6 citation statements)

References 5 publications

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“…In order to develop the film structure with high reflectivity, the samples A, B, C and D were analyzed by CF spectrometer [4]. Figure 4 and 5 show the reflectance for above samples, the reflectance of A (Mo/Al/Mo), B (Mo/Al/ITO), C (ITO/Mo/Al) and D (ITO/Mo/Al anneal) were respectively 49.9%, 63.3%, 88.9% and 87.8%.…”

Section: Analysis Of Reflective Film Structurementioning

confidence: 99%

P‐79: Research and Development of Reflective Display Technology

Wang

Guo

Song

et al. 2018

Symp Digest of Tech Papers

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This article mainly presents the R&D of the innovative technique about RLCD (Reflective Liquid Crystal Display). By means of fully independent innovation, products without backlight havebeen successfully developed. The reflectance of the reflecting films can reach 88.9%. The RLCD technology has been applied to current production lines without equipment investment. Meanwhile, by successfully solving key technical difficulty such as reflecting film structure, shared mask process and reflective metal layer corrosion, the best condition has been adopted in the products.

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Section: Analysis Of Reflective Film Structurementioning

confidence: 99%

P‐79: Research and Development of Reflective Display Technology

Wang

Guo

Song

et al. 2018

Symp Digest of Tech Papers

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“…Among the applications of molybdenum oxide, substoichiometric molybdenum oxide has gradually received more attention because of its excellent optical, electrical and catalytic properties. In the field of optoelectronics, MoO x can be used in the antireflection layer of displays [ 10 , 11 ], to improve solar energy conversion efficiency [ 12 , 13 , 14 , 15 ] and in new-generation sodium magnesium batteries [ 16 , 17 , 18 ]. In addition, it can also be used in catalysis [ 19 , 20 ], biomedicine [ 21 ], electronic devices [ 22 , 23 ] and other fields.…”

Section: Introductionmentioning

confidence: 99%

Thermal Stability, Optical and Electrical Properties of Substoichiometric Molybdenum Oxide

Qing

Yang

Chen³

et al. 2023

Materials

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Substoichiometric molybdenum oxide ceramics have aroused widespread interest owing to their promising optical and electrical performance. In this work, the thermal stability and decomposition mechanism of Mo9O26 and Mo4O11 at 700–1000 °C and 700–1100 °C were investigated, respectively. Based on this information, MoOx (2 < x < 3) bulk ceramics were prepared by spark plasma sintering (SPS). The results show that Mo9O26 is stable up to 790 °C in an argon atmosphere. As the temperature rises, it decomposes into Mo4O11. Mo4O11 can exist stably at 830 °C, beyond which it will convert to MoO2. The MoOx ceramic bulks with four different components (MoO2.9, MoO2.8, MoO2.7 and MoO2.6) were successfully sintered by SPS, and their relative density was greater than 96.4% as measured by the Archimedes principle. The reflectivity of MoOx ceramic bulk is low and only 6.3% when the composition is MoO2.8. The resistivity increases from 10−3 to 10−1 Ωcm with the increase in the O/Mo atomic ratio x. In general, the thermal stability information provides a theoretical basis for the processing of MoOx materials, such as the sintering of the MoOx target. The optical and electrical properties show that MoOx is a low-reflective conductive oxide material with great photoelectric application value.

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“…In the photovoltaic field, MoO x as the cathode buffer layer can effectively improve electrode contact, lower the Schottky barrier, and then improve the photovoltaic performance of solar cells [8]. For the narrow bezel in a thin-film transistor (TFT) backplane, MoO x is also a cost-efficient and reliable thin-film material [9]. In the new touch panel device, MoO x can be employed as a functional film to reduce the reflection of a metal-mesh electrode and to improve the effect of shadow elimination [10].…”

Section: Introductionmentioning

confidence: 99%

Effects of Sintering Temperature on MoOx Target and Film

Zhou¹,

Xiong

2022

Coatings

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The sintering process of the MoOx target has an impact on the quality of the sputtered film. In this study, powders of MoO3 (78 wt%) and MoO2 (22 wt%) were milled and hot-pressed to prepare the MoOx target. The effects of the sintering temperature of the MoOx targets on the properties of the sputtered MoOx films were investigated by X-ray diffraction, scanning electron microscopy, four-probe needle, and spectrophotometer tests. The research results revealed that the MoOx target at the sintered temperature of 1000 °C had a clear crystal structure and dense grains, exhibiting good sinterability, crystallization behavior, and film-forming property. The sputtered film deposited by the MoOx target could obtain high quality with a smooth interface and uniform thickness. The film had smaller resistivity, higher reflectivity, and appropriate transmissivity compared to the ones fabricated by other targets that were sintered at 800 °C, 900 °C, and 1100 °C.

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P‐63: Lower Reflective TFT Materials and Technology Innovation

Cited by 7 publications

References 5 publications

P‐79: Research and Development of Reflective Display Technology

P‐79: Research and Development of Reflective Display Technology

Thermal Stability, Optical and Electrical Properties of Substoichiometric Molybdenum Oxide

Effects of Sintering Temperature on MoOx Target and Film

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