2013
DOI: 10.1016/j.pmatsci.2013.03.002
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p-Type ZnO materials: Theory, growth, properties and devices

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Cited by 387 publications
(185 citation statements)
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References 425 publications
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“…In this work, stable and low resistive p-ZnO has been successfully achieved by dual acceptor doping of group-V elements P and N simultaneously in ZnO. This dual acceptor method is proposed to overcome the self-compensation effect in ZnO and also possess high hole concentration [17][18][19]. Undoped M A N U S C R I P T A C C E P T E D ACCEPTED MANUSCRIPT 4 distance between the substrate to nozzle can be found elsewhere [21].…”
Section: A N U S C R I P Tmentioning
confidence: 99%
“…In this work, stable and low resistive p-ZnO has been successfully achieved by dual acceptor doping of group-V elements P and N simultaneously in ZnO. This dual acceptor method is proposed to overcome the self-compensation effect in ZnO and also possess high hole concentration [17][18][19]. Undoped M A N U S C R I P T A C C E P T E D ACCEPTED MANUSCRIPT 4 distance between the substrate to nozzle can be found elsewhere [21].…”
Section: A N U S C R I P Tmentioning
confidence: 99%
“…Majority of the common semiconductor photocatalysts are binary compounds of formula MX S , where S is a small number usually from 1 to 4. For a given MX S lattice, Schottky defect pair (Ti-O for example) may be formed via (Fan et al 2013). However, Zn interstitials and oxygen vacancies are known to be the predominant ionic defect types which in other words means the prevalence of Frenkel defects.…”
Section: Defects In Semiconductor Solidsmentioning
confidence: 99%
“…CdO-ZnO thin films can be produced by several known technologies, such as chemical vapour deposition, "sol-gel" technique, laser ablation, radio-frequency and DC magnetron sputtering methods [9]- [14]. Each method has advantages and disad-vantages in terms of production procedures, equipment costs and resulting product properties; therefore, the development of new semiconductor production methods remains challenging.…”
Section: Introductionmentioning
confidence: 99%
“…The aim of the present research is to produce the thin films of CdO-ZnO by the extraction-pyrolytic method (EPM) [14]. Comparing with other production techniques of thin films the EPM has several advantages.…”
Section: Introductionmentioning
confidence: 99%