“…Anisotropic wet chemical etching of 〈100〉 oriented silicon by potassium hydroxide results in 100 times faster etching in the 〈110〉 direction than in the 〈111〉 direction leading to v-groove development. v-Grooves and polymer waveguides are fabricated on the same substrate using matched alignment marks ensuring accurate and reproducible alignment of fibers and polymer waveguides. , 20 Schematic representations of polymer waveguide−silica fiber coupling utilizing silicon v-groove technology are shown.…”
Section: Coupling a Polymer Waveguide To Silica
Fibersmentioning
confidence: 99%
“…However, first let us review the achievement of mechanically stable coupling of silica fibers to polymeric waveguides. Silicon v-groove technology, where anisotropic chemical etching 46,47 is used to etch a v-shape groove in a silicon substrate, affords a convenient and efficient means of reproducibly positioning silica fibers 48,49 relative to polymeric waveguides and provides a platform for the development of mechanically stable coupling by polymer overcoating of silica fibers placed in silica v-grooves. The process is illustrated in Figure 20.…”
Section: Coupling a Polymer Waveguide To Silica Fibersmentioning
Chromophores with optimized second-order optical nonlinearity to optical loss ratios are
synthesized, poled with an electrical field, and coupled into hardened polymer matrixes. Acentric
order, which is necessary for electro-optic activity, is optimized by the consideration of
chromophore−chromophore electrostatic interactions as well as chromophore−poling field
interactions and thermal collisions which randomize chromophore orientations with respect to
the applied field direction. Reactive ion etching and/or multicolor photolithography are used to
fabricate buried channel waveguide structures out of the resulting polymeric electro-optic
materials and to integrate polymeric waveguides with silica optical fibers. Tapered transitions
are developed to minimize coupling (insertion) loss. Both vertical and horizontal integration of
polymeric electro-optic modulator circuitry with semiconductor very large scale integration
circuitry is demonstrated. Modulation to 113 GHz is demonstrated. Polymeric modulators are
relevant to cable television, phased-array radar, ultrafast analogue-to-digital conversion, high-speed optical switching in local area networks, optical beam steering, optical backplane
interconnects for parallel processors, and voltage sensing.
“…Anisotropic wet chemical etching of 〈100〉 oriented silicon by potassium hydroxide results in 100 times faster etching in the 〈110〉 direction than in the 〈111〉 direction leading to v-groove development. v-Grooves and polymer waveguides are fabricated on the same substrate using matched alignment marks ensuring accurate and reproducible alignment of fibers and polymer waveguides. , 20 Schematic representations of polymer waveguide−silica fiber coupling utilizing silicon v-groove technology are shown.…”
Section: Coupling a Polymer Waveguide To Silica
Fibersmentioning
confidence: 99%
“…However, first let us review the achievement of mechanically stable coupling of silica fibers to polymeric waveguides. Silicon v-groove technology, where anisotropic chemical etching 46,47 is used to etch a v-shape groove in a silicon substrate, affords a convenient and efficient means of reproducibly positioning silica fibers 48,49 relative to polymeric waveguides and provides a platform for the development of mechanically stable coupling by polymer overcoating of silica fibers placed in silica v-grooves. The process is illustrated in Figure 20.…”
Section: Coupling a Polymer Waveguide To Silica Fibersmentioning
Chromophores with optimized second-order optical nonlinearity to optical loss ratios are
synthesized, poled with an electrical field, and coupled into hardened polymer matrixes. Acentric
order, which is necessary for electro-optic activity, is optimized by the consideration of
chromophore−chromophore electrostatic interactions as well as chromophore−poling field
interactions and thermal collisions which randomize chromophore orientations with respect to
the applied field direction. Reactive ion etching and/or multicolor photolithography are used to
fabricate buried channel waveguide structures out of the resulting polymeric electro-optic
materials and to integrate polymeric waveguides with silica optical fibers. Tapered transitions
are developed to minimize coupling (insertion) loss. Both vertical and horizontal integration of
polymeric electro-optic modulator circuitry with semiconductor very large scale integration
circuitry is demonstrated. Modulation to 113 GHz is demonstrated. Polymeric modulators are
relevant to cable television, phased-array radar, ultrafast analogue-to-digital conversion, high-speed optical switching in local area networks, optical beam steering, optical backplane
interconnects for parallel processors, and voltage sensing.
“…The fabrication process of the submount structure is based on a low-cost and high-yield wet anisotropic etching process of a (100) oriented Si wafer, exposing the {111} planes as commonly applied for the definition of alignment V-grooves for fiber-chip coupling [24]- [26]. It was readily demonstrated that these etch-bordering planes can be applied for beam deflection [27].…”
We report on a hybrid integration concept which allows high-density and alignment-tolerant surface mount assembly of top-illuminated photodetector (PD) arrays onto polymeric guided-wave components by means of a micromachined submount with an integrated mirror. This research aims at the development of polymeric waveguide based devices with an embedded optical power monitoring capability for applications in optical fiber communication networks. A prototype integrated multichannel optical power monitor comprising an eight-channel PD module and a polymeric waveguide splitter array was demonstrated which exhibited an average insertion loss of 5.2 dB, a PD coupling efficiency of 02.6 dB, and a crosstalk value of 017.1 dB between adjacent channels. Low polarization and wavelength sensitivity ( < 0.1 dB) was confirmed over a spectral range of 40 nm in both telecom wavelength windows. Index Terms-Hybrid integration, network monitoring and management, optical fiber communication, polymeric waveguide components, silicon micromachining.
“…Accurate assembly of these devices is very important in order to decrease the optical coupling loss on the optical module. The passive alignment method [1][2][3][4] is preferable to the active alignment method in terms of mass production and cost reduction.…”
mentioning
confidence: 99%
“…In order to realize efficient optical coupling, three-dimensional alignments are needed. If the vertical position of the waveguide (center of the transmission mode profile) coincides with the active layer of the laser diode automatically, the alignment of the channel waveguide device becomes two dimensional on the Si submount and we can adopt a passive alignment method [1][2][3][4] of using an image processing technique as a horizontal positioning method.…”
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