Pad Surface Treatment to Control Performance of Chemical Mechanical Planarization

Abstract

This paper addresses the development of parameter estimation techniques for a class of models used to characterize hysteresis and constitutive nonlinearities inherent to ferroelectric, ferromagnetic and ferroelastic materials employed in a wide range of actuators and sensors. These models are formulated as integral equations with known kernels and unknown densities to be identified through least-squares techniques. Due to the compactness of the integral operators, the resulting discretized models inherit ill-posedness which must be accommodated through regularization. The accuracy of regularized finite-dimensional models is illustrated through comparison with experimental data.

Experimental Investigation of Material Removal Characteristics in Silicon Chemical Mechanical Polishing

“…7(b). Figure 7(c) shows that the temperature on the pad rapidly increased to over 29 C when the polishing began, and then it continued to increase to 31 C during 10 min of polishing at low slurry flow rates of 100, 300, and 500 cm 3 /min. At high slurry flow rates of 700 and 1000 cm 3 /min, the temperature variations during polishing were much less than those at low slurry flow rates.…”

“…1. This causes the well-known viscoelastic behavior of the polishing pad, 30,31) which can be classified into elastic, viscoelastic, and permanent deformations based on the four-element model shown in Fig. 11(a).…”