“…The lowest internal resistance was in fact achieved with the stack of two cascades (eight devices), with values of 0.5 kΩ (MFCConf.1) and 2.9 kΩ (MFCConf.2). These results, in agreement with previous studies, is associated with an enhanced ion flow due to the functional increase in the anodic area achieved with stacking (Ortega-Martínez et al, 2012;Wang & Han, 2009). When MFC units are electrically connected in parallel the internal resistance tends to the lowest (Papaharalabos et al, 2015).…”