Parallel proximal probe arrays with vertical interconnections

Sarov, Y.; Frank, Andreas; Ivanov, Tzv.; Zöllner, Jens-Peter; Volland, Burkhard E.; Rangelow, Ivo W.; Brogan, A.; Wilson, R. H.; Zawierucha, P.; Zielony, M.; Gotszalk, Teodor; Nikolov, Nikolay; Zier, M.; Schmidt, Bertram; Kostic̆, I.

doi:10.1116/1.3256662

Cited by 11 publications

(5 citation statements)

References 17 publications

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“…Recently, Rangelow and co-workers reported a parallel cantilever SPM array of 2D-512 (4x64) based on a self-actuated piezoresistive cantilever set-up [12][13][14] (Figure 1). The goal of this work was not only to carry out a feasibility study of self-actuated piezoresistive cantilever design, but also to examine an experimental cantilever set-up relevant to imaging and SPL applications ( Figure 2).…”

Section: Self-actuated Piezoresistive Cantilever and Cantilever Arraysmentioning

confidence: 99%

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Nanoprobe maskless lithography

et al. 2010

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Scanning probe-based methods for surface modification and lithography are an emerging method of producing sub 20-nm features for nanoelectronic applications. In this study, we have demonstrated the nanoscale lithography based on patterning of 10 to 50-nm-thick calix[4]arene by electric-field-induced electrostatic scanning probe lithography. The features size control is obtained using electrostatic interactions and depends on the applied bias and speed of the AFM tip. The width of the obtained lines and dots varies from 10 to 60 nm depending on tip-sharpness, tip-substrate separation and tip-bias voltage.

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Section: Self-actuated Piezoresistive Cantilever and Cantilever Arraysmentioning

confidence: 99%

“…Figure 1. Optical microscope and SEM pictures of 2D-256 (64x4) self-actuated, piezoresistive cantilever array with vertical interconnections [12].…”

Section: Self-actuated Piezoresistive Cantilever and Cantilever Arraysmentioning

confidence: 99%

Nanoprobe maskless lithography

et al. 2010

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“…At the Technische Universität Ilmenau, the scientifictechnical bases for novel, piezoresistive, thermomechanically actuated lithography cantilevers [49] and cantilever arrays [50,51] were introduced and a unique understanding regarding their use for AFM and scanning probe lithography was gained. This work culminated in the development of special systems for very fast lithography and AFM measurements.…”

Section: Tip-based Nanofabricationmentioning

confidence: 99%

Tip- and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas

et al. 2021

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The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. 10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.

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“…Also, commercially available systems currently offer such scan speeds [22,23]; however, the scanning range has to be decreased to approximately 30% of the previously available range due to a reduction in the size of the piezoactuator. On the other hand, array systems with multiple probes have been tested because parallel scanning would increase the total imaging speed of large areas [24,25]. This requires, however, complex mechanical construction of the scanning head.…”

Section: Introductionmentioning

confidence: 99%

Dynamic speed control in atomic force microscopy to improve imaging time and quality

Sikora¹,

Bednarz²

2014

Meas. Sci. Technol.

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Quantitative, three-dimensional surface imaging is one of the most significant advantages of atomic force microscopy (AFM). The imaging speed, however, is its major issue, due to the limited response time of the feedback loop. We present a dynamically adjusted scanning speed feature implemented on a commercial AFM instrument. The signals available in the system are utilized for that purpose. The auxiliary module controls the scanning speed in order to provide the necessary time to restore the tip–sample distance, which may deviate due to insufficient settling time. The solution allows the measurement to be performed with a relatively fast scanning rate and the desired imaging quality. Quantitative analysis of the results shows the relation between the imaging error and the settings of the system. It is shown that the image is acquired faster and with better imaging quality than using the constant speed method. Also, the data are presented showing a reduction of the topographical crosstalk in the phase imaging feature, as an example of the utilization of this feature in advanced AFM modes.

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Parallel proximal probe arrays with vertical interconnections

Cited by 11 publications

References 17 publications

Nanoprobe maskless lithography

Nanoprobe maskless lithography

Tip- and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas

Dynamic speed control in atomic force microscopy to improve imaging time and quality

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