The magnetic properties of a series of electrodeposited ͓Co (x ML)/Cu (17 ML)͔ 100 multilayers have been examined as a function of the cobalt layer thickness. The multilayers were grown on Si͑100͒ covered with a highly textured Cu͑100͒ seed layer. Films with a cobalt layer thickness less than x Ͻ 1.7 monolayer equivalents ͑ML͒ exhibit superparamagnetic behavior due to the finite size of the cobalt islands comprising the discontinuous multilayer structure. In contrast, in films with x Ͼ 1.7 ML the lateral length scale becomes large enough to stabilize ferromagnetism and the giant magnetoresistance effect is observed. The influence of magnetocrystalline anisotropy is not apparent until 2.5 Ͼ x Ͼ 3.7 ML. The coercivity increases between 1.6 and 9 ML, reflecting the combined influence of the magnetocrystalline anisotropy and surface roughness.Ultrathin magnetic films have been the subject of numerous structural and magnetic studies. 1-3 Several interesting effects are known to occur as the film thickness approaches atomic dimensions, from suppression of the Curie temperature to alterations associated with the dimensionality of the system changing from 3D to zero. Multilayers which exhibit the giant magnetoresistance effect are of particular interest in light of technical applications ranging from magnetic field sensors to data recording devices. Cu/Co multilayers have received much attention as a model system due to the immiscibility of cobalt and copper in bulk alloys, the small lattice misfit between the respective face-centered cubic ͑fcc͒ structures, and large giant magnetoresistance ͑GMR͒ effects. Numerous studies of thin cobalt films, as well as Cu/Co multilayers, grown on Cu͑100͒ account for many of the recent advances in our understanding of the interaction between structure, processing, and the resulting magnetic properties ͑Ref. 4-25, and references therein͒. Although the majority of these studies have dealt with films produced by physical vapor deposition ͑PVD͒ techniques, there has also been considerable interest in producing these materials by electrodeposition. 26,27 Co/Cu multilayers have been electrodeposited onto a variety of substrates ͑e.g., Ref. 28 and 29͒ although in this paper our attention is restricted to growth on Cu͑100͒ surfaces. 26,27,[30][31][32][33][34][35][36] For example, welldefined Co/Cu multilayers have been grown on Cu͑100͒ which exhibit sixth-order Bragg scattering peaks in low-angle X-ray diffraction ͑XRD͒ experiments. 31 More recently, in situ X-ray scattering has been applied to study the evolution of epitaxy and strain relaxation in this system. 33 In order to develop magnetotransport devices based on Co/Cu multilayers, electrodeposition onto a variety of semiconducting substrates has also been explored ͑e.g., Ref. 37͒. Of particular relevance to this study are Co/Cu multilayers which have been grown on thin copper seed layer evaporated on Si͑100͒. The resulting films exhibit a strong ͑100͒ texture in the growth direction as well as fourfold symmetric texture within the plane ...