Parameters of vacuum deposition of ZnS:Mn active layer for electroluminescent displays

Abstract

In this article, x-ray diffraction measurements and scanning electron microscopy are employed to characterize the crystalline structure of the ZnS:Mn phosphor layers grown by thermal and electron-beam evaporation. The brightness–voltage and charge–voltage characteristics were used to estimate the efficiency of the active layer and to correlate it with the deposition conditions. The critical role of the preparation conditions and type of starting material is emphasized. Thermal deposition from a powder source has been found to favor the production of a smoother active layer. The use of specially prepared pellets has been found to be a key factor in the high-quality e-beam deposition of ZnS:Mn films. Peculiarities of both processes from the point of view of the evaporation kinetics are extensively discussed.

Shell Layer Thickness-Dependent Photocatalytic Activity of Sputtering Synthesized Hexagonally Structured ZnO-ZnS Composite Nanorods

“…Covering ZnS shell layer crystallites onto the ZnO nanorods, a proper thin-film process of ZnS is crucial to fabricate ZnO-ZnS core-shell composite nanorods with a successive architecture. Several techniques, including sputtering [ 15 ], thermal evaporation [ 16 , 17 ], pulsed laser deposition, [ 18 ], and chemical bath deposition [ 19 ] have been used to grow ZnS thin films. In particular, the sputtering technique is the most promising method for up-scaling the growth system while maintaining a good control of the deposition rate, so it is widely used in industrial applications [ 20 , 21 ].…”

Low temperature fabrication and characterization of wurtzite structured ZnS quantum dots by chemical spray pyrolysis

“…The commonly used techniques are thermal evaporation [21][22][23], sputtering [24,25], Chemical Bath Deposition (CBD) [26,27], Chemical Spray Pyrolysis (CSP) [28,29], Chemical Vapor Deposition (CVD) [30] etc. Among the various chemical deposition techniques, CSP is the one which is commercially attractive for the production of high quality, uniformly structured and well-crystalline thin films.…”