2022
DOI: 10.1016/j.compeleceng.2022.107930
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Parametric investigation and trap sensitivity of n-p-n double gate TFETs

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Cited by 12 publications
(3 citation statements)
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“…Additionally, HS-TFET provides the maximum sensitivity for E o = 0.45 eV for donor trap charges, E o = 0.65 eV in acceptor impurities at V gs = 0.3 V. It is seen that maximum sensitivity is observed at lower value of V gs in ZHP-TFET compared to HS-TFET due to variation in threshold voltage. Moreover, distribution reports maximum trap sensitivity when it lies in the middle of bandgap as shown in figures 16(c), (d)[23]. The maximum traps sensitivity is observed 12 000% and 120000% at E o = 0.65 eV and 0.45 eV for acceptor and donor like traps, respectively, in ZHP-TFET.…”
mentioning
confidence: 81%
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“…Additionally, HS-TFET provides the maximum sensitivity for E o = 0.45 eV for donor trap charges, E o = 0.65 eV in acceptor impurities at V gs = 0.3 V. It is seen that maximum sensitivity is observed at lower value of V gs in ZHP-TFET compared to HS-TFET due to variation in threshold voltage. Moreover, distribution reports maximum trap sensitivity when it lies in the middle of bandgap as shown in figures 16(c), (d)[23]. The maximum traps sensitivity is observed 12 000% and 120000% at E o = 0.65 eV and 0.45 eV for acceptor and donor like traps, respectively, in ZHP-TFET.…”
mentioning
confidence: 81%
“…The Gaussian distribution is the most practical distribution and therefore, during sensitivity calculation we consider such non-ideal distribution at oxide-semiconductor interface. Mathematically, it is defined as [20,23,24]:…”
Section: Device Structure and Simulation Setupmentioning
confidence: 99%
“…These variables determine the optical behavior of Many technologies have been adopted in the existing literature to resolve these vulnerabilities [6]. Some notable strategies include inserting a horizontal pocket in the source region [6], positioning a high-k gate dielectric oxide layer near the source side to increase the tunneling rate [7,8], using Mg 2 Si source heterojunction double-gate TFET [9] for reducing the concentrations of dopants in the drain region [10], etc. However, most of the research is conducted to better improve the electrical parameters of TFETs.…”
Section: Introductionmentioning
confidence: 99%