Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition

Xiang, Dong; Xia, Huanxiong; Wang, Yang; Peng, Mou

doi:10.1016/j.vacuum.2019.04.017

Cited by 21 publications

(8 citation statements)

References 26 publications

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“…The design of the showerhead is crucial as it directly affects the distribution of the flow field . By optimizing the structure of the showerhead, it is possible to control the deposition shape of the film and improve the uniformity of the film thickness. − When the shape of the microchannel on the showerhead changes, the deposition rate also changes simultaneously . Therefore, the structure of the microchannel directly affects the gas uniformity of the showerhead.…”

Section: Introductionmentioning

confidence: 99%

RETRACTED: Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures

Liu,

Yue,

Lin

2023

ACS Omega

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In the plasma-enhanced chemical vapor deposition (PECVD) process, a showerhead is used to enhance fluid uniformity in the chamber. The uniformity of the flow field will be affected by changing the microchannel on the showerhead, which in turn directly affects the uniformity of deposition. The showerhead will be etched during the cleaning process due to the presence of HF, which will form a fluoride layer. This layer will cause a decrease in the diameter of the microchannels, resulting in changes in the deposition uniformity. The impact of diameter changes can be reduced by making modifications to the microchannel structure. By adopting a coupling of the Navier−Stokes and Direct Simulation Monte Carlo (NS-DSMC) methods, we obtained the velocity variation of two typical microchannels (equal-diameter type and expansion type) under the same diameter change. The results indicate that compared to the equal-diameter type, the expansion type exhibits a smaller change in velocity for the same change in diameter. For the surface reaction limited regime, a stable velocity leads to a consistent residence time, which is advantageous for maintaining the uniformity of the film thickness. Therefore, compared to the equal-diameter type microchannel, the expansion type can reduce the impact of changes in diameter.

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Section: Introductionmentioning

confidence: 99%

RETRACTED: Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures

Liu,

Yue,

Lin

2023

ACS Omega

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“…This could be due to the pyrolysis of DCS and decomposition of NH 3 at lower temperatures, and then, the Si was formed and easily oxidized in air, which is consistent with the XRD results. The deposition rate also decreased significantly with decreasing temperature in agreement with the Arrhenius mechanism [33].…”

Section: Resultssupporting

confidence: 80%

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

Zhou,

Persson,

Xia

et al. 2023

Mater. Res. Express

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The utilization of silicon nitride coatings has been proposed as an effective method to enhance wear resistance and mitigate the release of metallic ions from biomedical implants. However, the relatively high dissolution rate of low-density coatings remains an obstacle to their implementation. Here, chemical vapour deposition techniques may have advantages over the typically used physical vapour deposition (PVD) methods. Therefore, in this study, silicon nitride coatings were obtained by low-pressure chemical vapor deposition (LPCVD). Since the nitrogen-to-silicon (N/Si) ratio and deposition temperature have been reported as major factors affecting the performance of the coatings, the effects of ammonia (NH3) to dichlorosilane (SiH2Cl2) flow ratio and deposition temperature were systemically investigated in the form of microstructure, mechanical and tribological properties of the coatings. The results revealed that the coatings exhibited a dense structure. As the ammonia flow ratio increased, the surface became smoother, and the hardness and elastic modulus increased and reached the maximum at a flow ratio of 4, giving a hardness of around 27 GPa and an elastic modulus of 290 GPa, respectively. The higher mechanical properties of the coatings deposited at a flow ratio of 4 are attributed to the stronger covalent Si-N bonding, as confirmed by XPS results. However, the coatings deposited at a flow ratio of 2 exhibited the lowest wear rate, at 9.5 × 10−7 mm3 Nm−1, around one-third of the value of the coatings deposited at a flow ratio of 6, likely due to the high silicon content of these coatings. Increasing the temperature resulted in an increased deposition rate, higher hardness and elastic modulus as well as a lower wear rate, likely due to incomplete reactions at lower temperatures. The generally high hardness and low wear rate indicate that the coatings deposited by LPCVD are promising for application in spinal implants.

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“…The Ag-free MoO 3 -SiO 2 nanocomposite coating and Ag-containing MoO 3 -SiO 2 nanocomposite coating were deposited by a double cathode glow discharge system [21] employing two targets with stoichiometric ratios of Mo 50 Si 50 and Mo 47.5 Si 47.5 Ag 5 , respectively. In attempts to avoid the negative effect of residual gas on quality of coatings [22], before sputter deposition, the chamber was pumped down to a residual gas pressure of 5 × 10 −4 Pa. Substrate specimens were etched by Ar ion bombardment at a potential of −650 V for 20 min to get rid of any contamination from the specimen surface. The working gas was composed of high-purity argon and oxygen, which passed into the chamber by mass flow controllers.…”

Section: Coatings Preparationmentioning

confidence: 99%

In vitro antibacterial properties of MoO3/SiO2/Ag2O nanocomposite coating prepared by double cathode glow discharge technique

Zhao

et al. 2020

Surface and Coatings Technology

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To obtain a self-disinfecting surface to combat nosocomial infections, in situ synthesis of the MoO 3-SiO 2-Ag 2 O nanocomposite antibacterial coating was prepared onto Ti-6Al-4V substrate via a double cathode glow discharge technique conducted in a Ar + O 2 gas mixture. The phase composition, microstructure and chemical structure of the as-prepared coating were systematically characterized by means of a series of microscopic examination methods. The microstructure of the coating exhibited an amorphous/nanocrystalline architecture, and both the MoO 3 and Ag 2 O crystallites were evenly embedded in an amorphous SiO 2 matrix. Photocatalytic activities of the coating were evaluated by photodegradation of rhodamine B (RhB) dye. The results showed that the introduction of Ag 2 O enhanced photocatalytic activity of the MoO 3-SiO 2 nanocomposite coating. In vitro antibacterial activity of the MoO 3-SiO 2-Ag 2 O coating against Gram-negative bacteria, Gram-positive bacteria and fungi were investigated and compared with that of the MoO 3-SiO 2 coating under both dark and visible light conditions. The MoO 3-SiO 2-Ag 2 O coating possessed higher bactericidal activities than the MoO 3-SiO 2 coating, due to the combined effects of surface hydrophobicity, the release of Ag + ions, surface acidic reaction and photocatalytic activity.

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Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition

Cited by 21 publications

References 26 publications

RETRACTED: Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures

RETRACTED: Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

In vitro antibacterial properties of MoO3/SiO2/Ag2O nanocomposite coating prepared by double cathode glow discharge technique

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