2023
DOI: 10.1088/1361-6595/acf342
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Particle charging during pulsed EUV exposures with afterglow effect

M Chaudhuri,
L C J Heijmans,
M van de Kerkhof
et al.

Abstract: The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3D Particle-In-Cell (3DPIC) simulation in a pulsed Extreme Ultra-Violet (EUV) exposure environment. It is found that the particle charge polarity (positive or negative) strongly depends on its size, location and background transient plasma conditions. The particle (100 nm diameter in size and conducting material) charge reaches steady state in a single pulse (20 µs) within the EUV beam in contr… Show more

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