The structure and morphology of titanium thin film electrodes have been investigated by neutron reflectometry. This technique yields a detailed depth profile of the scattering density, which is used to determine hydrogen and oxygen concentration profiles within the electrode. By depositing the electrode on a thick silicon crystal window, we are able to monitor the growth and dissolution of the protective oxide film covering the titanium as a function of time, electrode potential, and electrolyte composition. We find that, in 0.1 N sulfuric acid, the oxide dissolves at 0.7 A/h and is self-healing, meaning that as the oxide dissolves the metal underneath is oxidized to maintain a protective barrier. In contrast, when a -2 V cathodic bias is applied to a passive film, the oxide thins with no compensating oxide growth underneath, and the film undergoes electrochemical breakdown.