Molecular orientations of silicon phthalocyanine dichloride
(SiPcCl2)
thin films deposited on three different substrates have been measured by near-edge x-ray
absorption fine structure (NEXAFS) spectroscopy using linearly polarized synchrotron radiation.
The substrates investigated were highly oriented pyrolitic graphite (HOPG), polycrystalline
gold and indium tin oxide (ITO). For thin films of about five monolayers, the polarization
dependences of the Si K-edge NEXAFS spectra showed that the molecular planes of
SiPcCl2
on three substrates were nearly parallel to the surface. Quantitative analyses of
the polarization dependences revealed that the tilted angle on HOPG was only
2°, which
is interpreted by the perfect flatness of the HOPG surface. On the other hand, the tilted angle on ITO
was 26°. Atomic force microscopy (AFM) observation of the ITO surface showed that the periodicity of the
horizontal roughness is of the order of a few nanometres, which is larger than the molecular size of
SiPcCl2. It is
concluded that the morphology of the top surface layer of the substrate affects the molecular orientation
of SiPcCl2
molecules not only for mono-layered adsorbates but also for multi-layered thin
films.