Pattern evolution during ion beam sputtering; reductionistic view

Nanopatterning by ion beam sputtering in unconventional formats

“…We have also varied the polar angle during SIBS [27,28,30]. The ripple pattern is initially formed on Au(0 0 1) as shown in figure 4(a) by the grazing incidence of the ion beam, and then the beam is incident normal to the ripple-patterned surface.…”

“…Moreover, the temporal evolution of the ripple distribution in figure 7(b) is qualitatively well reproduced by the same simulation. (For further discussion on their comparison, see [30].) Note that we utilize the same set of the coefficients 8 for the eKS equation for reproducing the observed evolution of the nano bead patterns for the three different initial surfaces.…”

“…The upper histogram in a column indicates that at the later time corresponding to each data point in (a). Adapted from [30], Copyright 2016, with permission from Elsevier. to the anisotropic surface modification and the reduced symmetry in the pattern, making the surface swung by ∆φ = 360 • rougher than the rotating one for the same sputter condition as noted in figure 10(a).…”

“…We have performed the IBS experiments by simultaneously employing two ion beams, and have noticed that not the interference, but the competition of the instability along the two ion beam directions governs the pattern formation [22,23]. The other approach is the sequential application of IBS in different directions [24][25][26][27][28][29][30]. Here, the previously formed pattern serves as a template for the following pattern formation.…”

“…The upper histogram in a column indicates that at the later time corresponding to each data point in (a). Adapted from[30], Copyright 2016, with permission from Elsevier.…”