Pattern formation in hot embossing of thin polymer films

Schift, Helmut; Heyderman, Laura J.; Maur, Matthias Auf der; Gobrecht, J.

doi:10.1088/0957-4484/12/2/321

Cited by 128 publications

(98 citation statements)

References 10 publications

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“…Solution processing allows more flexibility for OLED implementation and design as with imprinting lithography, a promising lithographical technique that allows for an easy, cheap, and high resolution patterning of organic devices. 26,27 In this letter, we report photoluminescence characterization of ErQ 3 spin-coated sample demonstrating that the advantageous properties of this compound, i.e., wide absorption band and third window luminescence, are preserved by this deposition technique. A solution was prepared by dissolving ErQ 3 powder in dimethyl sulfoxide ͑DMSO͒ ͑Sigma-Aldrich͒, that was experimented to be the most effective solvent for ErQ 3 .…”

mentioning

confidence: 85%

Near-infrared photoluminescence of erbium tris(8-hydroxyquinoline) spin-coated thin films induced by low coherence light sources

Penna

Reale

Pizzoferrato

et al. 2007

Applied Physics Letters

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The authors present the characterization of spin-coated erbium tris͑8-hydroxyquinoline͒ ͑ErQ 3 ͒ solution on glass substrates under high temperature conditions. Absorption and infrared photoluminescence, induced by laser and light emitting diode sources, were measured and compared to cast and evaporated ErQ 3 samples. A broad absorption band and 1.52 m luminescence were observed, suggesting spin coating as a valid deposition technique for processing of organic infrared emitting diodes.

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mentioning

confidence: 85%

Near-infrared photoluminescence of erbium tris(8-hydroxyquinoline) spin-coated thin films induced by low coherence light sources

Penna

Reale

Pizzoferrato

et al. 2007

Applied Physics Letters

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“…Once the temperature in the film has been lowered to well below its glass transition temperature (40ºC or more below) it is lifted off the embossing roll. [18,33,36,37] This project has been split into three phases: Machine Design, Mold Design, and…”

Section: Introductionmentioning

confidence: 99%

A novel process for continuous thermal embossing of large‐area nanopatterns onto polymer films

2009

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Hot embossing and nanoimprinting processes are being widely practiced in industry. Fast and reliable production of micro/nanofeatured patterns on large‐area polymer films is of a great importance. In this study, a novel roll‐to‐roll thermal imprinting process was developed, capable of providing a mold‐heating rate of 125°C/s with sufficient temperature control to produce large‐area patterns continuously at a rapid production rate. With this new process, selected micro/nano patterns were produced on a polyethylene terephthalate film at a production rate exceeding 1 m/min. The roller mold temperature played a profound role in affecting the replication quality. To achieve good feature transfer properties, an elevated roller mold temperature approaching the melting temperature of the polymer was found to be critical. Microcavity filling time calculation further revealed that the elevated roller mold temperature is also necessary for achieving a rapid film feed rate as desired in the continuous roll‐to‐roll process. © 2010 Wiley Periodicals, Inc. Adv Polym Techn 28:246–256, 2009; Published online in Wiley InterScience (http://www.interscience.wiley.com). DOI 10.1002/adv.20167

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“…The problems are associated with the residual layer thickness under the stamp protrusions and incomplete filling of large cavities in the stamp. 21,22 A residual layer of the polymer is always remaining on the substrate after imprinting, and the polymer flow decreases rapidly when the residual film thickness decreases.…”

Section: Introductionmentioning

confidence: 99%

Solid state microcavity dye lasers fabricated by nanoimprint lithography

Nilsson

Nielsen

2004

Review of Scientific Instruments

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We present a solid state polymer microcavity dye laser, fabricated by thermal nanoimprint lithography (NIL) in a dye-doped thermoplast. The thermoplast poly-methylmethacrylate (PMMA) is used due to its high transparency in the visible range and its robustness to laser radiation. The laser dye is Rhodamine 6G ClO 4 . This dye is shown to withstand temperatures up to 240°C without bleaching, which makes it compatible with the thermal nanoimprint lithography process. The 1.55 m thick dye-doped PMMA devices are fabricated on a SiO 2 substrate, yielding planar waveguiding in the dye-doped PMMA with two propagating TE-TM modes. The laser cavity has the lateral shape of a trapezoid, supporting lasing modes by reflection on the vertical cavity walls. The solid polymer dye lasers emit laterally through one of the vertical cavity walls, when pumped optically through the top surface by means of a frequency doubled, pulsed Nd:YAG laser. Lasing in the wavelength region from 560 to 570 nm is observed from a laser with a side-length of 50 m. In this proof of concept, the lasers are multimode with a mode wavelength separation of approximately 1.6 nm, as determined by the waveguide propagation constant(s) and cavity dimensions. The stamps used in this work were fabricated by UV-lithography, limiting the lateral dimensional control of the devices. The resolution of NIL is ultimately limited by the quality of the stamps. Using electron beam lithography for stamp fabrication, the NIL process presented here offers the possibility for adding mode-selecting elements, e.g., diffractive-or sub-wavelength optical elements.

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Pattern formation in hot embossing of thin polymer films

Cited by 128 publications

References 10 publications

Near-infrared photoluminescence of erbium tris(8-hydroxyquinoline) spin-coated thin films induced by low coherence light sources

Near-infrared photoluminescence of erbium tris(8-hydroxyquinoline) spin-coated thin films induced by low coherence light sources

A novel process for continuous thermal embossing of large‐area nanopatterns onto polymer films

Solid state microcavity dye lasers fabricated by nanoimprint lithography

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