Pattern Generators for Reflective Electron-Beam Lithography (REBL)

Carroll, Allen

doi:10.1016/bs.aiep.2015.02.001

Cited by 8 publications

(3 citation statements)

References 13 publications

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“…A CMOS-based digital pattern generator module for electrons has been developed [219] for use in reflective electron beam lithography (REBL) [220]. The pattern generator module consists of an array of micron-sized electrostatic mirrors for electrons that selectively reflect or absorb electrons.…”

Section: Current and Future Challengesmentioning

confidence: 99%

“…While a dynamically programmable, reconfigurable electron wavefront modulator does not yet exist, advancements in the semiconductor industry may point a path to this. A CMOS-based digital pattern generator module for electrons has been developed [219] for use in reflective electron beam lithography (REBL) [220]. The pattern generator module consists of an array of micron-sized electrostatic mirrors for electrons that selectively reflect or absorb electrons.…”

Section: Advances In Science and Technology To Meet Challengesmentioning

confidence: 99%

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Roadmap on structured light

Rubinsztein‐Dunlop

Forbes

Berry

et al. 2016

J. Opt.

1,138

630

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Structured light refers to the generation and application of custom light fields. As the tools and technology to create and detect structured light have evolved, steadily the applications have begun to emerge. This roadmap touches on the key fields within structured light from the perspective of experts in those areas, providing insight into the current state and the challenges their respective fields face. Collectively the roadmap outlines the venerable nature of structured light research and the exciting prospects for the future that are yet to be realized.

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Section: Current and Future Challengesmentioning

confidence: 99%

Section: Advances In Science and Technology To Meet Challengesmentioning

confidence: 99%

Roadmap on structured light

Rubinsztein‐Dunlop

Forbes

Berry

et al. 2016

J. Opt.

1,138

630

View full text Add to dashboard Cite

show abstract

“…Electrodeposition is a preferred coating technique due to scalability and low cost [1]. Electroplating is a chemical process of depositing certain metal ions on the surface of alloys and other materials (such as plastics) by electrolysis to improve the ability of wear resistance [2,3], conductivity [4,5], reflectivity [6,7], anti-corrosion [8,9], etc. Conventional traditional electroplating is generally DC electroplating, and in recent years, with the improvement of the corrosion resistance and decorative requirements of enterprises, as well as the rapid development of pulse electrodeposition (PED), the traditional electroplating method has been unable to meet social needs.…”

Section: Introductionmentioning

confidence: 99%

A Study on the Influence of the Electroplating Process on the Corrosion Resistance of Zinc-Based Alloy Coatings

Cao,

Wang,

Lian

et al. 2023

Coatings

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A comprehensive analysis was conducted to examine the crystal phase composition, surface and cross-section morphology, elemental composition, thickness, and corrosion resistance of coatings. X-ray diffraction (XRD) was employed to investigate the texture and crystal phase of the materials while scanning electron microscopy (SEM) and energy-dispersive spectroscopy (EDS) were utilized to assess the surface and cross-section structure. Additionally, electrochemical techniques were employed to evaluate the corrosion performance. Compared to DC electroplating, the corrosion potential of pulsed galvanized ferroalloy alloy coating increased from −1031 mV to −1008 mV, and the corrosion current density decreased from 3.122 × 10−5 A∙cm−2 to 0.321 × 10−5 A∙cm−2. Moreover, the corrosion rate value of the coating obtained by the pulse rectifier (0.386 × 10−5 g m−2 h−1) was lower than that obtained by the DC power supply (3.75 × 10−5 g m−2 h−1). Additionally, pulsed electrodeposition reduced the iron content of the coating by 0.7%, thereby enhancing its corrosion resistance and flatness. The impedance parameters of the zinc–iron alloy coating acquired through the 30% duty cycle monopulser process exhibit superior performance compared to DC electroplating. Evidently, the monopulse coating’s structure enhances crystal packing density, augments coating thickness, improves adhesion to the substrate interface, and optimizes grain distribution uniformity. These factors are crucial determinants of the corrosion behavior exhibited by Ze–Fe coating.

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Flat electron mirror

Krielaart

Kruit

2021

Ultramicroscopy

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Pattern Generators for Reflective Electron-Beam Lithography (REBL)

Cited by 8 publications

References 13 publications

Roadmap on structured light

Roadmap on structured light

A Study on the Influence of the Electroplating Process on the Corrosion Resistance of Zinc-Based Alloy Coatings

Flat electron mirror

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