HIGHLIGHTSPhotocatalytic lithography is demonstrated as an efficient and versatile patterning strategy.Both positive and negative patterns of polymer brushes are obtained using direct photocatalytic lithography.Nanosphere lithography coupled to remote photocatalysis allows to achieve polymer pillars patterns with nanoscale size.
KEYWORDSPolymer brushes, Titanium dioxide, Photocatalytic lithography, Patterning, Nanosphere lithography, Nanopillars, SI-ATRP GRAPHICAL ABSTRACT ABSTRACT We demonstrate how micro-and nanostructures of polymer brushes can be prepared using photocatalytic lithography as a convenient and versatile approach. Both positive and negative micro-patterns of polymer brushes are obtained by patterning self-assembled monolayers through direct photocatalytic lithography. Such approach mimics conventional photolithography but is free from the disadvantages associated to the use of polymeric resists. Moreover, for the first time, the ability to generate nanometer-sized pillars of polymer brushes using remote photocatalysis coupled with nanosphere lithography is demonstrated. Our results confirm the great potentialities of photocatalytic lithography for efficient patterning of polymer brushes.