In
the past couple of decades, colloidal inorganic nanocrystals
(NCs) and, more specifically, semiconductor quantum dots (QDs) have
emerged as crucial materials for the development of nanoscience and
nanotechnology, with applications in very diverse areas such as optoelectronics
and biotechnology. Films made of inorganic NCs deposited on a substrate
can be patterned by e-beam lithography, altering the structure of
their capping ligands and thus allowing exposed areas to remain on
the substrate while non-exposed areas are redispersed in a solvent,
as in a standard lift-off process. This methodology can be described
as a “direct” lithography process, since the exposure
is performed directly on the material of interest, in contrast with
conventional lithography which uses a polymeric resist as a mask for
subsequent material deposition (or etching). A few reports from the
late 1990s and early 2000s used such direct lithography to fabricate
electrical wires from metallic NCs. However, the poor conductivity
obtained through this process hindered the widespread use of the technique.
In the early 2010s, the same method was used to define fluorescent
patterns on QD films, allowing for further applications in biosensing.
For the past 2–3 years, direct lithography on NC films with
e-beams and X-rays has gone through an important development as it
has been demonstrated that it can tune further transformations on
the NCs, leading to more complex patternings and opening a whole new
set of possible applications. This Perspective summarizes the findings
of the past 20 years on direct lithography on NC films with a focus
on the latest developments on QDs from 2014 and provides different
potential future outcomes of this promising technique.