2007
DOI: 10.1002/adfm.200700409
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Patterning Semiconductor Nanocrystals in Polymer Films

Abstract: This paper reports a method of patterning semiconductor nanocrystals (NCs) in a polymer film. By combining lithographic concept with polymerization‐induced phase separation in a NC‐monomer mixture, we produced topographic and lateral compositional patterns in NC‐polymer films. The quality of the patterns was controlled by the competition between the rate of polymerization‐induced phase separation and the change in viscosity of the polymerizing mixture.

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Cited by 31 publications
(24 citation statements)
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“…Therefore, special measures are required to preserve the structure [ 2 ] after removing the fi eld, such as embedding within a polymer. Polymer composites and thin fi lms containing NPs, including magnetic NPs, are well known, [3][4][5][6][7][8][9][10][11][12][13][14][15][16] as are microgels [ 17 ] and microcapsules. [ 18 ] There is signifi cant interest in embedding NP chains within polymers for their potentially anisotropic mechanical, [ 19 ] electrical, optical, magnetic, and thermal properties.…”
mentioning
confidence: 99%
“…Therefore, special measures are required to preserve the structure [ 2 ] after removing the fi eld, such as embedding within a polymer. Polymer composites and thin fi lms containing NPs, including magnetic NPs, are well known, [3][4][5][6][7][8][9][10][11][12][13][14][15][16] as are microgels [ 17 ] and microcapsules. [ 18 ] There is signifi cant interest in embedding NP chains within polymers for their potentially anisotropic mechanical, [ 19 ] electrical, optical, magnetic, and thermal properties.…”
mentioning
confidence: 99%
“…To understand the role of polymerization in the enrichment of the surface of pores with the NRs, we examined the relative rates of polymerization‐driven phase separation and increase in viscosity of the system. The time before the beginning of PIPS was determined by measuring the cloud point of the monomer mixture as a function of polymerization time 17. The extinction was measured at 640 nm, in order to minimize the contribution from light absorption by the photoinitiator at 400 nm and by gold NRs at 518 and 787 nm.…”
Section: Resultsmentioning
confidence: 99%
“…Photoluminescent NPs or nanorods may be patterned in polymer films by combining lithographic techniques with PIPS [12,13]. Production of pre-designed bidimensional patterns of photoluminescent regions is an important requirement for various photonic, biomedical and optoelectronic applications.…”
Section: Patterning Of Nps In Polymer Filmsmentioning
confidence: 99%
“…10 Fig .9 is a confocal fluorescence microscopy image showing a regular photoluminescent pattern generated from a 2 wt% solution of CdSe-ZnS core-shell NPs stabilized with trioctyl phosphine oxide in 2-ethylhexyl methacrylate, in the presence of hydroxycyclohexyl phenyl ketone as photoinitiator [12]. In order to generate regular patterns it was necessary to match the cloud point (start of PIPS) with the increasing viscosity of the polymerizing system, to use a film thickness less than 200 μ m to suppress natural convection patterns, and to select a convenient feature size of the mask [12]. When NPs were replaced by nanorods, the lateral diffusion produced an alignment of nanorods in the regions located under the mask [13].…”
Section: Patterning Of Nps In Polymer Filmsmentioning
confidence: 99%