Peculiarities of the Kinetics of Heterogeneous Processes during the Etching of Silicon in CF4 and C2Br2F4 Plasma

Miakonkikh, Andrey V.; Kuzmenko, V.; Efremov, Alexander; Руденко, К. В.

doi:10.1134/s1063739722700032

Russ Microelectron

2022

DOI: 10.1134/s1063739722700032

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Peculiarities of the Kinetics of Heterogeneous Processes during the Etching of Silicon in CF4 and C2Br2F4 Plasma

Andrey V. Miakonkikh

V. Kuzmenko

Alexander Efremov

et al.

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Peculiarities of the Kinetics of Heterogeneous Processes during the Etching of Silicon in CF4 and C2Br2F4 Plasma

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References 29 publications

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