2019
DOI: 10.3390/polym11010120
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PEG-assisted Sol-gel Synthesis of Compact Nickel Oxide Hole-Selective Layer with Modified Interfacial Properties for Organic Solar Cells

Abstract: As a p-type metal oxide, nickel oxide (NiO) has been extensively utilized for providing a favorable hole transport pathway in organic solar cells (OSCs). To obtain higher crystallinity, a post-annealing process at high temperature is required for the NiO layer. Therefore, fluorine-doped tin oxide (FTO) glass has been widely used for the substrate of NiO. However, the rough surface of the FTO substrate deteriorates the interfacial properties of the NiO layer, which hinders efficient charge extraction in OSCs. I… Show more

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Cited by 36 publications
(25 citation statements)
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“…K.S. Kim [30]. Overall, our XPS results strongly match with the earlier reported results and the consolidated table contains quantification of chemical states listed in Tables 3 and 4.…”
Section: Chemical Analysis (Xps)supporting
confidence: 90%
“…K.S. Kim [30]. Overall, our XPS results strongly match with the earlier reported results and the consolidated table contains quantification of chemical states listed in Tables 3 and 4.…”
Section: Chemical Analysis (Xps)supporting
confidence: 90%
“…In addition, they have also assigned the peaks at 857.1, 863 eV to the Ni +3 state [33,34]. Similarly, Dong-soo kim [36]. These trends are strongly in agreement with our XPS results and obtained multiple peaks are successfully assigned to Ni +2 and Ni +3 states with their total area of the peak summarized in table 3.…”
Section: Chemical Analysissupporting
confidence: 87%
“…Furthermore, a broad peak at around 27° corresponds to rGO suggesting the graphene sheet ordering along their stacking direction and characteristic peak at around 43.25° correspond to nickel oxide (NiO JCPDS card No. # 04-0835) [ 43 , 44 , 45 ]. The other characteristic peaks at positions (202) and (311) at 2θ value of 50.44° and 74.1°, respectively, correspond to copper oxide (CuO JCPDS card No.…”
Section: Resultsmentioning
confidence: 99%