2016 International Conference on Inventive Computation Technologies (ICICT) 2016
DOI: 10.1109/inventive.2016.7824876
|View full text |Cite
|
Sign up to set email alerts
|

Performance enhancement and supression of short channel effects of 14nm double gate FETs by using gate stacked high-k dielectrics & workfunction variation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
references
References 14 publications
0
0
0
Order By: Relevance