2022
DOI: 10.1007/s12633-022-01930-1
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Performance Evaluation & Linearity Distortion Analysis for Plasma- Assisted Dual-Material Carbon Nanotube Field Effect Transistor with a SiO2-HfO2 Stacked Gate-Oxide Structure (DM-SGCNFET)

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Cited by 7 publications
(3 citation statements)
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“…Increasing values of n i and T i lead to a faster generation of carbon monomers, thus leading to more diffusion of carbon ions. [27][28][29] This leads to an increase in CNT length. PECVD parameters directly influence device performance because they influence device geometry (radius and length).…”
Section: Resultsmentioning
confidence: 99%
“…Increasing values of n i and T i lead to a faster generation of carbon monomers, thus leading to more diffusion of carbon ions. [27][28][29] This leads to an increase in CNT length. PECVD parameters directly influence device performance because they influence device geometry (radius and length).…”
Section: Resultsmentioning
confidence: 99%
“…28,29 There are industrial & medical applications where the proposed structure could be deployed as PH 3 gas detector like environmental monitoring, chemical manufacturing, oil and gas industry, semiconductor manufacturing, breath analysis for disease detection, anesthesia monitoring & monitoring patient exhalation. [22][23][24] The applied gate bias modifies the overall gate-metal-work function by inducing an electric field (for polarising gate-dielectric) for the gas -molecules adsorbing thereupon. 30 The gate metal work function might vary in different ways, which affects the analog performance parameters such as drain current, transconductance etc.…”
Section: Device Structurementioning
confidence: 99%
“…The phosphine and Arsine gas adsorption changes the work function of the catalytic gold film, which alters the physical parameters for analysing the quantity of adsorbed phosphine. [22][23][24][25][26][27] Chemical groups of gate-stack material that have an affinity for PH 3 , facilitate its adsorption and detection. The proposed device characteristics are simultaneously affected by the change in the gate-metal-work function, therefore I Off , I On and g m variation in the device's is taken into account while calculating the gas sensitivity.…”
mentioning
confidence: 99%