IEEE Conference on Nuclear Science Symposium and Medical Imaging
DOI: 10.1109/nssmic.1992.301209
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Performance of a large area avalanche photodiode

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Cited by 23 publications
(1 citation statement)
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“…In spite of efforts by various groups these devices found very limited application because of poor stability, low production yield, high device-to-device variations and early breakdown due to local variations in resistivity. The bevel structure has a 15º angle that has to be contoured, polished or etched [4]. Subsequently, this edge has to be passivated and cured to avoid high surface currents.…”
Section: Introductionmentioning
confidence: 99%
“…In spite of efforts by various groups these devices found very limited application because of poor stability, low production yield, high device-to-device variations and early breakdown due to local variations in resistivity. The bevel structure has a 15º angle that has to be contoured, polished or etched [4]. Subsequently, this edge has to be passivated and cured to avoid high surface currents.…”
Section: Introductionmentioning
confidence: 99%