Periodic ZnO Nanorod Arrays Defined by Polystyrene Microsphere Self-Assembled Monolayers

Liu, DF; Xiang, YJ; Wu, Xianting; Z-X, Zhang; Lf, Liu; Li, Song; Zhao, Xiqian; Luo, SD; Ma, Wu; Shen, Jun; Zhou, Wenbin; Wang, G; Cy, Wang; Xie, Shuhong

doi:10.1021/nl061399d

Cited by 132 publications

(103 citation statements)

References 19 publications

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“…Thus, nanoscale discs, [127] rings, [128] ellipsoids [11] and crescent shaped particles [129][130] were successfully prepared as well as hole-films, [74,131] nanobowls, [132] nanoneedles, [14] membranes [132] and arrays of pillars of different materials. [133][134][135] …”

Section: Colloidal Lithographymentioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Section: Colloidal Lithographymentioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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“…Those ordered materials have a large number of technological applications such as sensors, optical coatings, storage devices, optoelectronic devices [29,30]. To make vertical deposition technique fruitful for deposition of colloidal particles of large size (micrometer scale), it is better to evaporate the solvent faster by increasing the temperature [31,32].…”

Section: Introductionmentioning

confidence: 99%

Weak ac field-induced patterns in vertical deposition of colloids at various evaporation rates

Aslam

Pichumani²,

González-Viñas

2015

Eur. Phys. J. Spec. Top.

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Abstract. Pattern formation in colloids by weak ac fields in vertical deposition-like configuration at different temperatures has been studied experimentally. At low evaporation (room temperature), the effect of the field leads to the evolution of a one-dimensional array of clusters along the contact line and columnar colloidal dried deposits are obtained at higher evaporation. We investigate the flow dynamics involved in this pattern formation. Homogeneous variation of the contact angle by electrowetting effect becomes unstable and breaks the translational symmetry at the meniscus. Electrokinetic forces together with capillary forces result in the accumulation of particles for pattern formation. The movement of electrically charged colloidal particles is controlled by weak ac electric field even at higher temperatures. We observe the effect of increasing initial particle concentration on the behavior of the clusters for various field frequencies. The average distance between clusters increase monotonically with an increase in the initial particle concentration. We also observe that the average width of columns increases according to the applied field strength.

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“…Array density has been shown to have a large impact on the efficiency and uniformity of FE devices [4]. This control over array morphology can be achieved using nanosphere lithography (NSL) and there are many examples in the literature of well ordered, periodical arrays of ZnO nanowires grown via the use of NSL [5][6][7][8][9] to create an initial ordered template of metal islands on a substrate. NSL relies on producing a lithographic mask comprised of a close packed monolayer of polystyrene beads which can be produced with differing aperture sizes and separation.…”

Section: Introductionmentioning

confidence: 99%

“…This technique is most commonly used in conjunction with vapor phase transport growth for ZnO nanowires where, under suitable conditions, the nanowire growth occurs at the metal catalyst point only. NSL has been used to create well ordered arrays of ZnO nanowires on substrates such as sapphire [5][6][7] and GaN thin films [8], however to our knowledge this technique has not been applied to growth on ZnO substrates, ZnO buffer layers or even directly on Si substrates. The development of ordered arrays on these types of substrate would have a number of advantages such as removing the possibility of -4 -unwanted doping from the substrate (e.g., Al from sapphire substrates) and also allowing reductions in cost due to the use of a range of cheaper substrate materials and enable potential scalability to large area substrates [10].…”

Section: Introductionmentioning

confidence: 99%

Control of ZnO nanowire arrays by nanosphere lithography (NSL) on laser-produced ZnO substrates

Garry

McCarthy

Mosnier

et al. 2011

Applied Surface Science

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Nanosphere lithography (NSL) is a successful technique for fabricating highlyordered arrays of ZnO nanowires typically on sapphire and GaN substrates. In this work, we investigate the use of thin ZnO films deposited on Si by pulsed laser deposition (PLD) as the substrate. This has a number of advantages over the alternatives above, including cost and potential scalability of production and it removes any issue of inadvertent n-type doping of nanowires by diffusion from the substrate. We demonstrate ordered arrays of ZnO nanowires, on ZnO-coated substrates by PLD, using a conventional NSL technique with gold as the catalyst. The nanowires were produced by Vapor Phase Transport (VPT) growth in a tube furnace system and grew only on the areas pre-patterned by Au. We have also investigated the growth of ZnO nanowires using ZnO catalyst points deposited by PLD through an NSL mask on a bare silicon substrate.

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Periodic ZnO Nanorod Arrays Defined by Polystyrene Microsphere Self-Assembled Monolayers

Cited by 132 publications

References 19 publications

Surface Patterning with Colloidal Monolayers

Surface Patterning with Colloidal Monolayers

Weak ac field-induced patterns in vertical deposition of colloids at various evaporation rates

Control of ZnO nanowire arrays by nanosphere lithography (NSL) on laser-produced ZnO substrates

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