Permanent reduction of dissipation in nanomechanical Si resonators by chemical surface protection

Abstract

We report on mechanical dissipation measurements carried out on thin (∼100 nm), single-crystal silicon cantilevers with varying chemical surface termination. We find that the 1-2 nm-thick native oxide layer of silicon contributes about 85% to the friction of the mechanical resonance. We show that the mechanical friction is proportional to the thickness of the oxide layer and that it crucially depends on oxide formation conditions. We further demonstrate that chemical surface protection by nitridation, liquid-phase hydrosilylation, or gas-phase hydrosilylation can inhibit rapid oxide formation in air and results in a permanent improvement of the mechanical quality factor between three-and five-fold. This improvement extends to cryogenic temperatures. Presented recipes can be directly integrated with standard cleanroom processes and may be especially beneficial for ultrasensitive nanomechanical force-and mass sensors, including silicon cantilevers, membranes, or nanowires.

Nanomechanical Motion Transducers for Miniaturized Mechanical Systems

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Efficient anchor loss suppression in coupled near-field optomechanical resonators

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Fluorescence Sensing with Cellulose‐Based Materials

“…With the development of sensing technology, conventional solution‐based sensing has gradually shown limitations in real applications . In comparison, solid‐state sensor materials have some preferred advantages such as portability, operational simplicity, and reusability, which make rapid online detection possible at a low cost . These materials‐based probes may be ultimately employed for basic laboratory assays as portable measurement devices and for household use as commercial indictors.…”