2015
DOI: 10.1109/ted.2015.2413671
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Perovskite-Based Solar Cells With Nickel-Oxidized Nickel Oxide Hole Transfer Layer

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Cited by 26 publications
(9 citation statements)
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“…Uniformity of the HTL film is an important factor because it can directly affect the morphology of following photoactive layer. Unlike in former works 27 30 32 in which additional effort was needed to optimize the morphology of the perovskite photoactive layer on the NiO layer because of its nonuniformity, our uniform NiO layer could be prepared on ITO by simply spin-casting NiO NP solution, as shown in the AFM ( Fig. 1a,b,e ) and SEM images (inset of Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…Uniformity of the HTL film is an important factor because it can directly affect the morphology of following photoactive layer. Unlike in former works 27 30 32 in which additional effort was needed to optimize the morphology of the perovskite photoactive layer on the NiO layer because of its nonuniformity, our uniform NiO layer could be prepared on ITO by simply spin-casting NiO NP solution, as shown in the AFM ( Fig. 1a,b,e ) and SEM images (inset of Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The work function ( ϕ ) of the NiO layer, defined as ϕ = 21.21 − ( E cutoff − E i ), was calculated to be 5.37 eV. The configuration of our device (glass/ITO/NiO/CH 3 NH 3 PbI 3 /PCBM/LiF/Al) and the energy levels of each layer 21 22 23 24 25 26 27 28 29 30 31 32 33 34 are depicted in Fig. 3 .…”
Section: Resultsmentioning
confidence: 99%
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“…The majority of work on inverted planar cell structures is based on ITO substrates to achieve smooth interfaces. For example, Lai et al reported a PCE of 7.75 % for ITO/NiOx/CH3NH3PbI3/PCBM/BCP/Al cell structures which involved additional high-temperature annealing at 450 °C [27]. More recently, Weber et al reported a PCE of 12.8% for a small scale (0.09 cm 2 ) p-i-n device with a cell configuration of ITO/NiOx/PK/PC60BM/Ag using a Cs0.08(MA0.17FA0.83)0.92Pb(I0.83Br0.17)3 based PK [28].…”
Section: Resultsmentioning
confidence: 99%
“…Although reactive evaporation of NiO x has been reported, its electronic properties, such as conductivity and work function, have not been reported . Generally, the fabrication of efficient NiO x films by evaporation often involves two steps: deposition of Ni metal films first and oxidation into NiO x later . The NiO x deposited in this way were highly dense, with excellent electron blocking property.…”
Section: Niox‐based Planar Pscsmentioning
confidence: 99%