2017
DOI: 10.1088/1361-6528/aa80b4
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Peroxide induced volatile and non-volatile switching behavior in ZnO-based electrochemical metallization memory cell

Abstract: We explore the use of cubic-zinc peroxide (ZnO) as a switching material for electrochemical metallization memory (ECM) cell. The ZnO was synthesized with a simple peroxide surface treatment. Devices made without surface treatment exhibits a high leakage current due to the self-doped nature of the hexagonal-ZnO material. Thus, its switching behavior can only be observed when a very high current compliance is employed. The synthetic ZnO layer provides a sufficient resistivity to the Cu/ZnO/ZnO/ITO devices. The h… Show more

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Cited by 36 publications
(24 citation statements)
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“…Figure a shows the memory retention of both the HRS and the LRS at V read = 1 V in time under ambient conditions. Clearly, no considerable degradation was observed for 10 4 s in the range measured in other works . Figure b shows the current variations measured at 1 V after each cycle of the writing and erasing processes for 600 cycles in the voltage scan from 0 to 9 V and 9 to 15 V. The observed small fluctuations of the current in the two memory states (the HRS and the LHS) are within the range of the inherent offset between two successive measurements.…”
mentioning
confidence: 49%
“…Figure a shows the memory retention of both the HRS and the LRS at V read = 1 V in time under ambient conditions. Clearly, no considerable degradation was observed for 10 4 s in the range measured in other works . Figure b shows the current variations measured at 1 V after each cycle of the writing and erasing processes for 600 cycles in the voltage scan from 0 to 9 V and 9 to 15 V. The observed small fluctuations of the current in the two memory states (the HRS and the LHS) are within the range of the inherent offset between two successive measurements.…”
mentioning
confidence: 49%
“…As a candidate for next-generation memory storage, resistive random access memory (RRAM) has attracted more and more researchers' attention because it has the potential to achieve the excellent storage properties mentioned above [11][12][13]. Metal oxides of various properties have been used to study RRAM as materials because of full compatibility with the standard complementary metal oxide semiconductor (CMOS) process [14], such as TaO x [15][16][17], Zr [18][19][20], ZnO 2 [21][22][23], TiO 2 [24][25][26], and HfO 2-x [27,28]. In these materials, as an excellent storage medium, HfO 2-x has been the research focus.…”
Section: Introductionmentioning
confidence: 99%
“…Flexible electronics are more portable and deformable in comparison with silicon-based devices [ 10 , 11 , 12 ]. However, most RRAM-based synaptic memories are composed of various inorganic materials, such as HfO x , Al 2 O 3 , and ZnO [ 13 , 14 , 15 ]. These inorganic materials usually require high temperature treatment steps with poor stretchability.…”
Section: Introductionmentioning
confidence: 99%