GaN‐based metal‐semiconductor‐metal ultraviolet photodetectors (PDs) are fabricated on bulk GaN substrate. The dislocation density of the homoepitaxial layer characterized by cathodoluminescence mapping technique is ∼5×106 cm‐2. The PDs exhibit ultra‐low dark‐current of <5 pA at room temperature under 15 V bias, with an ultraviolet/visible rejection ratios up to 5 orders of magnitude. Even at a high temperature of 150 °C, the dark current of the device at 15 V bias is still <50 pA, with a reasonable ultraviolet/visible contrast of more than 5000, indicating that such kind of devices are suitable for high temperature operation. The responsivity of the PD increases as a function of applied bias, resulting in a quantum efficiency exceeding 100% at above medium bias. The photocurrent gain of the PD is attributed to photogenerated holes trapped at surface states as well as high‐field‐induced image‐force lowering effect. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)