2000
DOI: 10.1002/1521-3951(200007)220:1<289::aid-pssb289>3.0.co;2-1
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pH Effect on the Deposition of CdS on ZnO and SnO2:F Substrates by CBD Method

Abstract: CdS thin films were deposited on ZnO and SnO2:F substrates by the Chemical Bath Deposition (CBD) method, varying the solution's pH between 9 and 11. The samples were characterized through transmittance and AFM measurements. It was found that the transmittance and the morphological properties as well as the growth rate of the CdS thin films are significantly affected by the solutions' pH. Good results were obtained using pH values between 9 and 10.

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Cited by 6 publications
(2 citation statements)
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“…Cadmium sulfide (CdS) film of the II-VI group is generally used as a wide band gap 2.42 eV semiconductor. CdS is one of the best materials for the fabrication of high efficiency polycrystalline thin film solar cells, either based on cadmium telluride or copper indium diselenide (CIS) [3][4][5]. On the other hand, the Cu-CdS bilayer systems are used for the preparation of metal-coated semiconductor nanocrystals which are of great interest for the fabrication of optical and electroluminescent devices [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…Cadmium sulfide (CdS) film of the II-VI group is generally used as a wide band gap 2.42 eV semiconductor. CdS is one of the best materials for the fabrication of high efficiency polycrystalline thin film solar cells, either based on cadmium telluride or copper indium diselenide (CIS) [3][4][5]. On the other hand, the Cu-CdS bilayer systems are used for the preparation of metal-coated semiconductor nanocrystals which are of great interest for the fabrication of optical and electroluminescent devices [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the use of well-known sacrificial layers like porous silicon, polysilicon, silicon dioxide and phosphosilicate glass (PSG) requires hazardous chemicals like HF, which also attacks ZnO simultaneously [11][12][13][14]. Furthermore, ZnO films are used as a sacrificial layer for the fabrication of microstructures, because it has faster etching rate in both acidic and alkaline chemicals [15,16]. So, a diluted chemical may attack and deform the shape and size of nanowires in active region during fabrication process.…”
Section: Introductionmentioning
confidence: 99%